Polycrystalline ZnSx Se1—x thin films deposited on ITO glass by MBE

MBE growth of ZnSx Se1-x thin films on ITO coated glass substrates were carried out using ZnS and Se Sources with the substrate temperature ranging from 270℃ to 330℃.The XRD θ/2θ spectra resulted from these films indicated that the as-grown polycrystalline ZnSx Se1-x thin films had a preferred orientation along the (111) planes.The evaluated crystal sizes as deduced from the FWHM of the XRD layer peaks showed strong growth temperature dependence,with the optimized temperature being about 290℃.Both AFM and TEM measurements of these thin films also indicated a similar growth temperature dependence.Hing qual-ity ZnSx Se1-x thin film growm at the optimized temperature had the smoothest surface with lowest RMS valus of 1.2 nm and TEM cross-sectional micrograph showing a well defined columnar structure.     

用于FBAR的C轴取向AlN压电薄膜的研制

用射频（RF）反应磁控溅射法,在硅基片上制备出了具有较低表面粗糙度、C轴择优取向的AlN压电薄膜.讨论了溅射功率对AlN压电薄膜结构和形貌的影响、氮气含量对AlN压电薄膜成分的影响以及低温退火对薄膜表面粗糙度的影响.XRD和SEM结果表明：随溅射功率增大,AlN压电薄膜C轴择优取向增强;当功率为350W时,AlN压电薄膜（002）面摇摆曲线半高宽为4.5°,薄膜表现出明显的柱状结构.EDS成分分析表明：随氮气含量的提高,AlN压电薄膜的元素比接近于化学计量比.低温退火工艺的引入将薄膜表面的均方根粗糙度由4.8nm降低到2.26nm.     

6H-SiC衬底上InN单晶薄膜的RF-MBE生长

采用射频等离子体辅助分子束外延(RF\|MBE)方法在6H\|SiC衬底上制备纤锌矿结构的氮化铟（InN）薄膜. 利用原位X射线光电子能谱测试确定了InN的修正俄歇参数α′=852.76 eV和Wagner图,  InN的铟氮质量比为1.19; 扫描电子显微镜和原子力显微镜测试表明, 外延InN为网状结构, 表面无铟滴; X射线衍射测试表明, 薄膜为单一c轴择优取向生长, 其摇摆曲线半高宽为32.6 弧分; 室温光致发光峰中心位于1 575 nm处.      

离化原子团束外延ZnSe单晶薄膜

本文报道了用离化原子团束（ＩＣＢ）技术在ＧａＡｓ（１００）上外延ＺｎＳｅ单晶薄膜的研究结果。采用单源喷发并用电子能谱分析了外延薄膜的成分。用互光衍射和ＲＨＥＥＤ研究了外延ＺｎＳｅ单晶薄膜结构和外延质量。得到了摆动曲线半高宽为１３３＂，并具有原子水平平整程度的ＺｎＳｅ（１００）单晶薄膜。     

Growth of C60(111) single crystalline thin film on Ni3Co(111) substrate

Conclusions We have studied C₆₀ films grown on Ni₃Co(111) single-crystalline substrate using hotwall diffusion method. The XRD and SEM results show that high-quality C₆₀ (111) singlecrystalline film with grain size of ∼ 1 μm can be obtained at the substrate temperature of 150 ° C. Due to the strong interfacial interaction between C₆₀ and Ni₃Co(111) substrates, temperature has much more influence on the orientation of the film than that of the film grown on nonmetallic substrates. The film grown at 100 ° C has a weak orientational order and the film grown at 200 ° C is randomly oriented.     

氧化锌薄膜的制备及掺Co2+对结构和性能的影响

采用溶胶-凝胶方法在Si(111)衬底上制备了ZnO:Co氧化锌薄膜,利用X射线衍射(XRD)仪和振动样品磁强计(VSM)分别测试了样品的结构和磁性.实验表明,采用溶胶-凝胶方法制备的掺Co2+氧化锌薄膜具有(002)峰的择优取向,同时ZnO:Co薄膜在室温情况下呈现出铁磁性.     

Fabrication of tungsten films by metallorganic chemical vapor deposition

Tungsten films growing on copper substrates were fabricated by metallorganic chemical vapor deposition (MOCVD). The chemical purity, crystallographic phase, cross-sectional texture, and resistivity of the deposited films both before and after annealing treatment were investigated by X-ray energy-dispersive spectroscopy (EDS), X-ray diffraction (XRD), scanning electron microscopy (SEM), and four-point probe method. It is found that the films deposited at 460℃ are metastable β-W with (211) orientation and can change into α-W when annealed in high-purity hydrogen atmosphere at high temperature. There are small amounts of C and O in the films, and the W content of the films increases with increasing deposition temperature and also goes up after annealing in high-purity hydrogen atmosphere. The films have columnar microstructures and the texture evolution during their growth on copper substrates can be divided into three stages. The resistivity of the as-deposited films is in the range of 87-104 μΩ·cm, and low resistivity is obtained after annealing in high-purity hydrogen atmosphere.     

CeO2 thin films grown on biaxially textured nickel (001)

CeO\-2 films have been grown on biaxially textured Ni substrates at various temperatures. The results show that CeO\-2 films without IBAD are dominated by (111) orientation from room temperature to 800℃ while the preferential orientation of CeO\-2 films with IBAD is (001) at lower deposition temperature and (111) at deposition temperature higher than 450℃. CeO\-2 films with better in_plane texture and out_of_plane orientation can be grown at 360℃ with 240 eV ion energy and 200 μA/cm\+2 ion current density.     

Fabrication and Photocatalytic Characteristics of TiO2 Films on Silicon Substrates

Silicon ( 111 ) and Silicon (100) have been employed for fabrication of TiO2 films by metal organic chemical vapor deposition (MOCVD). Titanium (Ⅳ) isopropoxide (Ti[O (C3H7)4 ])was used as a precursor. The as-deposited TiO2 films have been characterized with Field emission scanning electron microscopy (FE-SEM), X ray diffraction (XRD) and atomic force microscopy (AFM). The photocatalytic properties were investigated by decomposition of aqueous orange Ⅱ. The crystalline and structural properties of TiO2 film had crucial influences on the photodegradation efficiency. For MOCVD in-situ deposited films on Si substrates, thephotoactivities varied following a shape of “M”: At lower (350 ℃ ) middle (500 ℃) and higher (800 ℃) temperature of deposition, relative lower photodegradation activities have been observed. At 400 ℃ and 700 ℃ of deposition, relative higher efficiencies of degradation have been obtained, because one predominant crystallite orientation could be obtained as deposition at those two temperatures, especially a single anatase crystalline TiO2 film could be obtained at 700 ℃ growth.     

基片温度对ZnO薄膜结构和发光性能的影响

采用对靶直流反应磁控溅射方法,在不同温度的Si (100)基片上制备了一系列的ZnO薄膜.利用X射线衍射仪和荧光分光分度计对ZnO薄膜的结构和发光性能进行了研究.结果表明:所有的ZnO薄膜都具有六角纤锌矿结构,且都表现出了(002)织构.随基片温度增加,ZnO薄膜结晶质量提高,其颗粒尺寸单调增加,并且薄膜应力状态发生改变,由压应力转变为拉应力.同时光致发光谱实验结果表明:室温沉积的ZnO薄膜出现了365 nm和389 nm的紫外双峰,并且出现了弱的蓝光发射带.随着基片温度升高到350℃,365 nm附近的紫外峰红移到373 nm,并且强度增强,而389 nm处的紫外峰强度明显减弱.当基片温度增加到500℃时,373 nm的发光峰强度减弱并蓝移到366 nm处,蓝光带强度减弱并红移到430 nm～475 nm处,并且出现了396 nm的近紫峰.     

衬底对溶胶-凝胶法制备ZnO薄膜晶体结构和发光特性的影响

采用溶胶-凝胶(Sol-Gel)旋涂法在Si(100)和熔石英衬底上制备ZnO薄膜,利用X射线衍射(XRD)、光致发光谱(PL)等手段分析得到ZnO薄膜的晶体结构和发光特性.结果表明,在Si(100)衬底上制备的ZnO薄膜呈现沿各个晶面自由生长的特性,而熔石英衬底上制备的样品呈现沿c轴择优取向生长的特性.     

沉积温度对NbN膜层微观结构的影响

利用有磁过滤器的等离子体沉积装置,在不同温度的Si基底上沉积氮化铌（NbN）薄膜,通过XRD,XPS,SEM等分析,研究了NbN薄的表面表貌与微观结构跟温度的关系,发现沉积温度对掺优取向有较强的影响：从室温到约300℃得到的薄膜在（220）峰表现出很强的择优取向,500℃（220）峰变得很弱,（200）峰表现出择优取向,但不明显,同时,膜层中N和Nb的原子比先随温度的升高而升高,后稍有降低,温度升高,δ-NbN的晶粒变大,室温到300℃很难得到完整的NbN膜,而在500℃得以的薄膜完整且光滑,膜层中得到单一的δ-NbN相。     

多晶3C-SiC薄层的淀积生长及结构性能分析

采用ＨＦＣＶＤ生长法,以较低生长温度,在Ｓｉ（１１１）衬底上淀积３Ｃ－ＳｉＣ（１１１）薄层。用ＸＲＤ、ＶＡＳＥ、ＸＰＳ等分析手段研究了薄层的结构、光学常数、组分及化学键等性能。ＸＲＤ显示薄层具有明显的择优取向特征。ＶＡＳＥ测量出薄层的折射率为２．６８６,光学常数随深度的变化曲线反映出薄层的多层结构。ＸＰＳ深度剖面曲线表明薄层中Ｓｉ／Ｃ原子比符合ＳｉＣ的理想化学计量比,其能谱证明Ｃ１ｓ与Ｓｉ２ｐ成键形成具有闪锌矿结构的３Ｃ－ＳｉＣ。     

Cu掺杂对ZnO纳米薄膜的结构及其光学特性的影响

采用磁控溅射法(RF)在玻璃基底上制备了未掺杂和不同Cu掺杂浓度的ZnO薄膜.使用X射线衍射仪(XRD)、原子力显微镜(AFM)、扫描电子显微镜(SEM)分别对样品的形貌进行了表征,并对ZnO薄膜进行了应力分析.结果显示:所有样品都呈现出(002)衍射峰,有较好的c轴择优取向;所有样品出现有3个发光峰,分别对应于400 nm(3.14 eV,紫光),444 nm(2.78 eV,蓝光),484 nm(2.56 eV,蓝光).紫峰的存在与激子的存在有极大关系,而蓝光发射主要是由于电子从导带上向锌空位形成的浅受主能级上的跃迁.随着Cu掺杂量的增加,薄膜的带隙宽度Eg随之减小,样品光学带隙值由3.26 eV逐渐减小为2.99 eV.实验中还发现,随着Cu掺杂量增加,薄膜的透射率也随之减小.     

射频磁控溅射制备c轴取向LiNbO3薄膜研究

采用射频磁控溅射技术,用富Li的LiNbO3靶材在Si(100)和Si(111)基底上制备了LiNbO3薄膜.通过X射线衍射仪(XRD)、扫描电子显微镜(SEM)和X射线光电子能谱(XPS)对LiNbO3薄膜的结晶程度、晶体取向和表面形貌及薄膜与基底结合处的界面结构进行了研究.结果表明:样品在空气中经1 000℃退火1 h处理后,薄膜与Si基底界面处有SiO2生成,得到的LiNbO3薄膜结晶性好,具有高c轴取向,晶粒排列致密且粒径尺寸均匀.     

溅射气压对ZnO薄膜生长、发光性能和结构的影响

沉积缺陷少、晶粒高度c轴择优生长的ZnO薄膜是制备短波发光器件和压电谐振传感器的关键问题之一.以ZnO为靶材,采用射频磁控溅射法在玻璃衬底上制备纳米ZnO薄膜,实现了室温下强的紫外受激发射和弱的深能级发射.通过对薄膜表面形貌的观测, 以及对X射线衍射(XRD)谱和室温光致发光(PL)谱的分析,研究了不同溅射气压对ZnO薄膜生长、结构和发光性能的影响.结果显示溅射气压在1.9 Pa-3.5 Pa之间,晶粒直径先增大后减小,在2.6 Pa时晶粒生长到最大;在3.2 Pa时薄膜单一取向性最优,以此推断最佳的溅射气压在2.6 Pa-3.2 Pa之间.实验在玻璃衬底上制备出了XRD衍射峰半高宽仅为0.12°的、高度c轴择优生长的ZnO薄膜.     

直流辉光放电等离子体增强化学气相法制备金刚石及氮化碳薄膜

采用直流辉光放电等离子体增强化学气相沉积(PECVD)技术方法 ,在Si(100)衬底上制备了金刚石薄膜 ,并在此基础上合成了含有少量晶态颗粒的非晶氮化碳薄膜     

5,10,15-三对氯苯基-20-邻(α-氧基硬脂酸)苯基卟啉Langmuir-Blodgett膜的性质研究

研究了具有双亲性的5,10,15-三对氯苯基-20-邻(α-氧基硬脂酸)苯基卟啉(TSPP)在气-液界面上的成膜性能,制备了不同层数的TSPP LB膜.利用UV-vis分光光度计,小角x射线衍射,原子力显微镜等方法,研究了膜的表面形貌及卟啉分子在膜中的排列取向及相互作用.实验结果表明:双亲性的5,10,15-三对氯苯基-20-邻(α-氧基硬脂酸)苯基卟啉(TSPP)在气液界面上具有良好的成膜性能,制备的单层和多层LB膜性能稳定并具有良好的纵向均匀性和结构周期性.在旋转涂得的薄膜上,TSPP分子以聚集体的形式分散分布,未聚集的TSPP分子形成的薄膜,表面分布着大量针孔状的缺陷;LB膜表面平整均匀,TSPP分子的环平面紧密地排列在一起以羧基为支撑点垂直“站立”在基片平面上,分子侧链与基片平面成52.3°角排列.     

溅射功率和淀积时间对MgxZn1-xO薄膜结构特性的影响

用射频磁控溅射法在硅衬底上制备出MgxZn1-x O薄膜,研究了溅射功率和淀积时间对薄膜结构特性的影响,X射线衍射(XRD)谱和原子力显微镜(AFM)图像表明：MgxZn1-x O薄膜为六角纤锌矿结构,且具有非常好的沿垂直于衬底的c轴的择优取向,随着溅射功率和淀积时间的增加,X射线衍射峰的衍射角变大,半高宽(FWHM)减小,平均晶粒尺寸增加,薄膜结晶质量显著提高。     

采用修正的溶胶-凝胶技术制备PZT铁电薄膜

采用一种修正的溶胶-凝胶技术制备出Pb[Zr0.52Ti0.48]O3（PZT）铁电薄膜.对溶胶的整个制备过程进行了红外透射光谱分析,对制备的铁电薄膜结构和性能进行了表征.由XRD图可以看出,退火温度在600℃以上时,薄膜结构为纯的钙钛矿结构.由P-E曲线可以看出,经600℃退火处理的PZT薄膜具有良好的铁电性能.