沉积温度对NbN膜层微观结构的影响

利用有磁过滤器的等离子体沉积装置，在不同温度的Si基底上沉积氮化铌（NbN）薄膜，通过XRD，XPS，SEM等分析，研究了NbN薄的表面表貌与微观结构跟温度的关系，发现沉积温度对掺优取向有较强的影响：从室温到约300℃得到的薄膜在（220）峰表现出很强的择优取向，500℃（220）峰变得很弱，（200）峰表现出择优取向，但不明显，同时，膜层中N和Nb的原子比先随温度的升高而升高，后稍有降低，温度升高，δ-NbN的晶粒变大，室温到300℃很难得到完整的NbN膜，而在500℃得以的薄膜完整且光滑，膜层中得到单一的δ-NbN相。

THE INFLUENCES OF DEPOSITION TEMPERATURE ON THE MICROSTRUCTURE OF NIOBIUM NITRIDE FILMS

Filtered vacuum arc plasma deposition apparatus is used todeposit NbN thin films on Si substrate at different temperatures ranging from room temperature(RT) to about 500℃. The influences of deposition temperature on the microstructure and morphology of the coatings are studied using XRD, XPS and SEM. It is shown that the deposition temperature has a strong effect on preferred orientation. At the range of RT to 300℃, δ-NbN phase has a preferred orientation on (220) peak; and at the substrate temperature of about 500℃, δ-NbN phase (200) peak becames preferred with the intensity of (220) peak decreasing badly. The atomic ratio of N and Nb in the coatings enhances with the increasing deposition temperature at first, and then reduces in a way. The grain size of δ-NbN is larger when deposition temperature becames higher. From RT to 300℃ a full coating could not obtained, and when the temperature is increased to 500℃ a full and smooth film consisting of single-phase δ-NbN is fabricated.