电晕极化偶氮化合物薄膜倍频弛豫特性研究

把主体材料聚甲基丙烯酸甲酯(PMMA)和客体偶氮化合物,用溶胶-凝胶法制成溶胶,旋涂成膜,测量了其紫外-可见吸收光谱和厚度.用电晕极化的方法对薄膜进行极化,然后实时监测了不同温度和不同厚度下薄膜的二次谐波产生(SHG)强度随时间退极化的特性.利用双指数函数拟合其驰豫曲线,结果表明,对于厚度相同的偶氮薄膜,随温度的升高其平均驰豫时间变短;而相同温度下不同厚度的薄膜,平均弛豫时间随厚度增加而增加.     

偶氮聚合物薄膜的全光极化特性及其驰豫过程研究

利用旋涂法制备了一种偶氮类化合物掺杂有机聚合物薄膜,并对其吸收谱、厚度、折射率、进行了测量,采用二次谐波产生的方法的方法对全光极化后薄膜的二阶非线性光学特性进行了研究.实验结果表明,随着薄膜厚度和生色团含量的增加其二阶非线性增强.这与聚合物薄膜中含有较高浓度的分散红1有关.对极化饱和后的驰豫情况进行了分析,发现不同厚度薄膜的驰豫速度不同.这是由于薄膜中偶氮分子含量越多,分子间相互作用越强,导致驰豫时间增长.     

主客体掺杂薄膜的电晕和全光极化非线性光学特性研究

把偶氮化合物对硝基双甲胺基偶氮苯作为客体掺杂到主体PMMA中利用旋涂法制备成薄膜，然后对薄膜进行电晕极化和全光极化，利用二次谐波产生法研究薄膜的非线性光学特性．实验结果表明：电晕极化后在测量的10min内薄膜的二次谐波信号几乎没发生驰豫，但全光极化后的薄膜其二次谐波信号衰减近一半．这主要是由于电晕极化和全光极化的作用机制不同所导致．     

钙钛矿型锰氧化物La0.7Sr0.3MnO3的磁谱研究

报导了钙钛矿型锰氧化物La0.7Sr0.3MnO3多晶体材料不同温度下磁谱的初步研究结果，平均粒径分别为45、66、105、140和1200nm的样品由溶胶－凝胶法制备，当平均粒径大于105nm时，样品的磁谱为典型的预豫型谱线，共振频率和准静态磁导率随温度降低而减少；随平均粒径增加，准记磁导率增大，而共振频率却减小，当平均粒径小于66nm时，观察不到类似的驰豫，实验结果显示，驰豫谱线主要是由于畴壁位移造成的，而畴壁位移的阻尼主要是与畴壁位移相联系的微观涡流效应。     

La0.7Sr0.3MnO3外延膜厚度引起的电阻率变化

不同厚度的La0.7Sr0.3MnO3(LSMO)外延薄膜被沉积到立方相的LaA lO3(001)单晶衬底上,XRD测试结果显示,LSMO外延膜的结构是单相的,具有与衬底相同的晶格取向;随着膜厚的增加,LSMO外延膜的晶格经历应变到驰豫的变化.电阻测量显示,应变驰豫的薄膜(较厚的薄膜)有较大的电阻率,这与该膜中缺陷浓度增加有关.此外,也对生长在不同单晶衬底上的LSMO外延膜(厚度相同)的结构和电阻进行了对比研究.     

玉米胚芽胚乳中油水动态行为的NMR研究

本文应用核磁共振时域二维弛豫相关谱分析的方法，对玉米胚芽的核磁共振驰豫特性进行了研究。对以下三种样品进行了测定：（１）胚芽不含油（用化学方法蒸馏出）但是含有不同百分含量的水；（２）胚芽不含水（真空下加热）但是含有不同百分含量的油；（３）含有不同百分含量的水的胚乳－水系统。研究表明随着水含量的增加水的纵向驰豫时间Ｔ１减小，表明水与胚芽基质具有强烈的相互作用，而油的纵向驰豫时间Ｔ１随着含油含量的增加变     

纳米尺度水薄膜液-气相变分子动力学模拟

采用分子动力学模拟,研究了纳米尺度水薄膜厚度和系统温度对液-气相变蒸发率的影响.模拟了水薄膜厚度为2nm时,温度(375~425K)对相变蒸发率的影响;同时模拟了温度400K条件下,水薄膜厚度(2、3、4nm)对相变蒸发率的影响.结果表明:相同水薄膜厚度下蒸发率随着温度的升高而增大,相同温度下蒸发率随水薄膜厚度的增大而增大,蒸发率随时间呈指数形式递减.相关结果可为微热管及其他依靠内部液体相变传热的散热器件设计提供参考.     

Pb（In1/2Nb1/2）O3-Pb（Mg1/3Nb2/3）O3-PbTiO3弛豫铁电薄膜厚度尺寸效应研究

新一代弛豫铁电薄膜Pb(In_1/2Nb_1/2)O₃-Pb(Mg_1/3Nb_2/3)O₃-PbTiO₃(PIMNT)因兼具优异的电学性能与高的相变温度,在国内外获得广泛关注.为了探究不同薄膜厚度对PIMNT薄膜的结构及电学性能的影响,通过溶胶凝胶法制备了150 nm～1μm不同厚度的PIMNT薄膜,对其形貌结构以及电学性能进行了对比研究,在此基础上进一步研究了极化对其电学性能的影响.实验结果表明:随着厚度的增加,薄膜介电常数先增加后略有降低,剩余极化强度先增大后减小,矫顽场逐渐增大;在极化电压为18 V、极化温度和时间分别为100℃和5 min时,1μm厚度PIMNT薄膜的介电常数和损耗在100 Hz下分别为1 009和0.022,室温下的热释电系数达6.85×10^-4C·m^-2·K^-1,是目前主流的锆钛酸铅(PZT)薄膜的3倍左右.     

成膜条件对聚氨酯微孔膜性能的影响

采用单因素的分析方法研究质量分数、预干燥时间、涂层厚度、凝固浴温度等成膜参数与以N，N二甲基甲酰胺（DMF）为溶剂的溶剂型聚氨酯（PU）的成膜性能，包括薄膜的孔隙率、厚度、透湿性能（WVP）的关系．结果表明，随PU质量分数的增大，膜厚度与平方米质量都在增加且趋势相似，而膜的孔隙率和透湿量呈下降趋势；薄膜厚度随涂层厚度的增加而线性增加；凝固浴温度升高的过程中，透湿量波动明显；随预干燥时间的延长，透湿量缓步下降．     

Cu薄膜应力的计算机模拟与表征

用Monte Carlo法以Cu为例对薄膜生长过程中薄膜应力进行计算机模拟。将分子动力学法引入到连续体薄膜的生长过程中,通过面上的假想力来实现薄膜应力的计算机模拟.模拟结果表明,在一定原子入射率和基底温度下,在薄膜厚度极其薄的情况下,薄膜应力随薄膜平均厚度的增加而增大,薄膜应力随薄膜表面粗糙度的增大也增大,薄膜应力—厚度随原子沉积个数趋向于线性关系,并且模拟了薄膜应力与薄膜表面粗糙度以及沉积时间的关系曲线。     

聚丙烯酸酯核／壳乳液膜的应力松弛

合成了阴离子乳化剂含量不同的５种聚丙烯酸酯核／壳乳液，分别成膜，用岛津ＡＧ－Ａ材料试验机，进行了５种膜的应力松弛试验，求出了应力松弛模量和应力松弛函数，应力松弛函数形式为Ｅ＝Ａｔ＾Ｂ，并讨论了成膜厚度对应力松弛数据的影响。     

梯度过渡层对TiC薄膜中残余应力影响的研究

用平行光束掠射法（ＧＩＸＤ）测定了磁控溅射ＴｉＣ（Ａｌ基体）膜中的残余应力，比较了不同厚度的梯度过渡层对残余应力的影响。     

应用于太阳能电池的AZO透明导电薄膜光学性质研究

以铝掺杂氧化锌陶瓷靶作为溅射源,采用射频磁控溅射工艺在玻璃衬底上制备了掺铝氧化锌（AZO）透明导电薄膜,利用全光谱拟合法计算了AZO薄膜的光学常数和厚度,研究了厚度对AZO薄膜光学性质的影响.结果表明：拟合光谱曲线与实测光谱曲线一致,薄膜的光学性能与厚度密切相关,AZO薄膜折射率表现为正常的色散特性.另外还采用包络法计算了AZO薄膜的折射率和厚度,两种方法所得结果基本相符.     

薄膜厚度对Cu膜光电性能的影响

在室温条件下,用直流磁控溅射Cu靶制备出了不同厚度的Cu膜,测量了Cu膜的光学透过率和面电阻,分析了光电性质薄膜厚度的变化情况．实验结果表明,随着Cu膜厚度的增加,其光学透过率逐渐减小,透过率在波长为580nm处出现峰值．Cu膜的面电阻随薄膜厚度的增加先急剧减小,然后减小变得缓慢,最后趋于定值．理论模拟了Cu膜的光学透过率随薄膜厚度的变化和光学透过率随入射光波长的变化,理论模拟结果与实验结果吻合．     

Production of HfO2 thin films using different methods: chemical bath deposition,SILAR and sol-gel process

Hafnium oxide thin films (HOTFs) were successfully deposited onto amorphous glasses using chemical bath deposition, successive ionic layer absorption and reaction (SILAR), and sol-gel methods. The same reactive precursors were used for all of the methods, and all of the films were annealed at 300°C in an oven (ambient conditions). After this step, the optical and structural properties of the films produced by using the three different methods were compared. The structures of the films were analyzed by X-ray diffraction (XRD). The optical properties are investigated using the ultraviolet-visible (UV-VIS) spectroscopic technique. The film thickness was measured via atomic force microscopy (AFM) in the tapping mode. The surface properties and elemental ratios of the films were investigated and measured by scanning electron microscopy and energy-dispersive X-ray spectroscopy (EDX). The lowest transmittance and the highest reflectance values were observed for the films produced using the SILAR method. In addition, the most intense characteristic XRD peak was observed in the diffraction pattern of the film produced using the SILAR method, and the greatest thickness and average grain size were calculated for the film produced using the SILAR method. The films produced using SILAR method contained fewer cracks than those produced using the other methods. In conclusion, the SILAR method was observed to be the best method for the production of HOTFs.     

氮气氛围下热处理的Na（0.5）Bi（0.5）TiO3薄膜的低温介电性能研究

采用溶胶凝胶法在LiNaO3（LNO）衬底上制备Na0.5Bi0.5TiO3（NBT）薄膜.部分NBT薄膜在氮气氛围下进行了热处理,记为NBT-N2.在100～400 K的温度范围内,测量了NBT-N2的介电性能.NBT-N2薄膜的介电频谱中出现了损耗峰,存在弛豫现象.利用Arrhenius公式拟合弛豫所对应的激活能,发现在NBT-N2薄膜中存在2个热激活过程：一个对应氧空位电离引入的极化子的跳跃跃迁;另一个对应导电电子与偏离氧八面体中心的Ti离子之间的耦合.此外,采用复阻抗谱分析了NBT-N2薄膜中的介电弛豫过程,在测试温度范围内,随着温度的升高,该弛豫过程逐渐趋向于理想的德拜模型.     

纳米TiO2薄膜紫外-可见透射光谱研究

对于采用溶胶-凝胶法和电子束蒸发在普通载玻片上制备的均匀透明纳米TiO2薄膜，通过观测薄膜的紫外-可见光透射率光谱，对其光谱特性和吸收边缘进行了研究，同时测算了TiO2薄膜的光学禁带宽度．     

Hardness of Mn_2V_2O_7 thin films and its influential factors

Mn2V2O7 thin films were deposited onto amorphous glass substrates using a chemical bath deposition method and different deposition time. X-ray diffraction(XRD) analysis was used to define the structure of the films. Their roughness, thickness, and surface properties were evaluated through atomic force microscopy(AFM). The hardness of the films was measured using a nanohardness tester. The film thickness, average grain size, and roughness were positively correlated with each other. These three parameters were observed to increase with the deposition time. The film thickness and average grain size were inversely correlated with the hardness and roughness. In addition, the number of crystallites per unit area and the dislocation density were observed to be positively correlated with the hardness and roughness. This study was designed to elucidate and formalize the underlying reasons for these relationships.     

Hardness of Mn2V2O7 thin films and its influential factors

Mn2V2O7 thin films were deposited onto amorphous glass substrates using a chemical bath deposition method and different deposition time. X-ray diffraction (XRD) analysis was used to define the structure of the films. Their roughness, thickness, and surface properties were evaluated through atomic force microscopy (AFM). The hardness of the films was measured using a nanohardness tester. The film thickness, average grain size, and roughness were positively correlated with each other. These three parameters were observed to increase with the deposition time. The film thickness and average grain size were inversely correlated with the hardness and rough-ness. In addition, the number of crystallites per unit area and the dislocation density were observed to be positively correlated with the hardness and roughness. This study was designed to elucidate and formalize the underlying reasons for these relationships.     

蓝宝石衬底上酞菁铜薄膜的生长及相变研究

 采用真空蒸发沉积方法在Al₂O₃衬底上生长CuPc薄膜,用X射线衍射、扫描电子显微镜、紫外-可见光分光光度计多种测试手段表征薄膜的结构,研究不同沉积速率、不同膜厚和衬底温度对CuPc薄膜结构的影响.研究结果表明：CuPc薄膜的晶粒尺寸随沉积速率的增大而减小,薄膜越厚,结晶度越高,CuPc薄膜退火温度约为250℃时发生相变,由原来的亚稳态α-CuPc晶型结构转变为稳定的β-CuPc晶型结构.
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