氢化锂薄膜防水解技术的研究

运用磁控溅射方法溅射在贴有聚乙烯膜的硅片上沉积氢化锂薄膜,并在氢化锂薄膜的表面沉积不同厚度的铝膜。采用x射线衍射和红外光谱测试,分析研究了不同厚度铝膜对防止氢化锂薄膜分解所起的作用。研究结果表明,随着铝膜厚度的增加,氢化锂薄膜与水或CO_2反应变质的几率越小,铝膜厚度为55 nm时,样品测试结果显示铝膜对氢化锂薄膜起到了一定的保护作用,延缓了氢化锂薄膜与空气中水和CO_2等杂质的反应。     

表面诱导开环聚合制备聚合物刷的实验

针对通过反应时间调控聚合反应在室温条件下硅基表面的聚合物薄膜厚度问题,采用表面诱导活性开环聚合的方法,以N-己基-5-降冰片烯-2,5-二羧酰亚胺为聚合单体,通过对聚合催化剂的筛选,确定使用Grubbs二代催化剂,进行聚合物刷制备的实验研究.实验结果表明:通过表面诱导活性开环聚合,把聚合物通过化学键连接到基板表面,获得了厚度超过100 nm、表面光滑的、大面积生长的纳米级聚合物刷.研究结果对采用表面诱导开环聚合方法制备出高质量的聚合物刷有非常重要的理论意义和实用价值.     

Li_2TiO_3/BaTiO_3纳米复合薄膜的制备

目的分析钛酸钡(BaTiO_3,BT)作为压电薄膜材料的优缺点及其改进方法,研究Li_2TiO_3/BaTiO_3纳米复合薄膜的制备工艺,并为后期探索其介电、铁电性能做好基础性工作。方法以层状钛酸H_(1.07)Ti_(1.73)O_4晶体和Ba(OH)_2为原料,采用溶剂热法制备BT粉体。再分别以钛酸锂(Li_2TiO_3,LT)晶体和BT晶体作为基料和反应模板,采用水系流延法制备Li_2TiO_3/BaTiO_3纳米复合薄膜(LT/BT)。探索混合时间和添加剂比例对制备薄膜的影响。结果当固相粉体的质量含量为55%,分散剂(PVP)、粘结剂(苯丙乳胶)以及增塑剂(丙三醇)的含量分别占添加剂总质量的5.5%,11%和5.5%,并将球磨时间控制在24 h时,可制备得到较稳定的基体浆料。所得基体浆料经流延成型后可得到LT/BT纳米复合薄膜。结论调控基体浆料的制备方法和添加剂组分,可制备得到表面平整光滑、质地均匀、塑性和延展性良好且不易开裂的LT/BT纳米复合薄膜。     

磁控溅射制备纳米Ni-Al薄膜的表面粗糙度和电阻率的研究

研究了在纳米厚度范围内,Ni-Al薄膜的电阻率与表面粗糙度的关系. 利用直流磁控溅射方法,使用高纯度(99.99%)的Ni 、Al靶, 通入Ar气制备了Ni-Al薄膜,薄膜的厚度为15nm～140nm. 在室温下通过直线四探针和原子力显微镜测量了不同厚度Ni-Al薄膜的电阻率和表面粗糙度,结果表明电阻率变化和表面粗糙度成近似线性关系.     

金属片上制备纳米(微米)晶薄膜发展与实验分析

纳米薄膜是指纳米晶粒构成的薄膜,或将纳米晶粒镶嵌于某种薄膜中构成的复合膜,以及每层厚度在纳米量级的单层或多层膜。其性能强烈依赖于晶粒(颗粒)尺寸、膜的厚度、表面粗糙度及多层膜的结构。与普通薄膜相比,纳米薄膜具有许多独特的性能,例如巨电导效应、巨磁电阻效应、巨霍尔效应、可见光发射等。目前制备纳米薄膜的方法很多,其中水热法是很重要的一种。本论文利用水热法以金属锌片作为基片和反应物,加入尿素和NaH2PO4·2H2O或Zn(H2PO4)2·2H2O,以CTAB或OP作为表面活性剂,制备出由菱柱状、块状和片状微米晶组成的磷酸锌薄膜,讨论了反应物的种类、表面活性剂的类型、表面活性剂(CTAB)的加入量、反应时间、反应温度和尿素对磷酸锌物相和微晶形貌的影响,对不同形貌纳米(微米)晶薄膜的形成机理进行了讨论。     

生物纳米薄膜的制备及其AFM表征

生物纳米薄膜的制备与表征对功能性有机化合物的实用化起着非常重要的作用.本文主要介绍利用分子自组装、LB技术以及将旋涂技术与AFM针尖操控相结合的方法分别制备的黄原胶、硬脂酸和壳聚糖纳米生物薄膜及其AFM表征结果.AFM测试显示,黄原胶分子在分子间协同作用下可以形成具有网状结构薄膜,NaCl盐溶液浓度和浸泡时间等可以调控在硬脂酸LB膜上所蚀刻孔径的大小.同时,AFM形貌表征与其操控技术的联用,不仅得到了薄膜表面的实时形貌,而且制备出具有纳米级厚度的超薄壳聚糖纳米膜.这些研究不仅为生物纳米薄膜的制备与表征提供了新型的方法及思路,而且可以进一步推动纳米薄膜在多种领域内的发展与应用.     

玻璃基片上磁控溅射制备纳米TiO2薄膜的亲水性能研究

采用射频磁控溅射法制备了纳米TiO2薄膜,应用原子力显微镜观察了薄膜表面形貌,通过测量薄膜表面水滴直径计算接触角的方法研究了TiO2薄膜的亲水性能,发现磁控溅射制备的TiO2薄膜在紫外灯照射下有明显亲水性.     

沉积温度对类金刚石薄膜性能的影响

液相法制备工艺简单、成本低等,已成为制备类金刚石薄膜的热点方法,但适合工业化生产的制备工艺参数尚不明确。以Si单晶为基底,通过液相沉积法在Si表面制备类金刚石薄膜,研究了沉积温度与其摩擦学性能之间的关系。结果表明:在40℃条件下制备的类金刚石薄膜表面光滑平整、硬度最高。此时类金刚石薄膜的干摩擦系数最小,耐磨性最强,具有良好的摩擦学性能。     

表面修饰和电场对氮化镓薄膜电学性质的调控机理研究

采用第一性原理模拟方法研究表面修饰和电场对氮化镓纳米薄膜电学性质的影响。对于表面镓原子和氮原子分别进行氢化、氟化或氯化得到的氮化镓纳米薄膜(A-Ga N-B),当层厚相同时,Cl-Ga N-H和Cl-Ga N-Cl薄膜的能隙较小,而H-Ga N-H和F-Ga N-F薄膜的能隙较大。当层厚增加时,相同表面修饰的氮化镓纳米薄膜能隙将逐渐减小,最终由半导体转变为导体。当施加垂直电场时,薄膜能隙将依赖于电场方向呈现线性增加或者降低。该研究结果将会为氮化镓纳米材料应用于纳米电子器件提供重要的理论指导。     

类金刚石碳膜和氮化钛的摩擦学性能研究

报道了在相同条件下用磁控溅射方法在硅片上制备类金刚石膜和氮化钛薄膜的研究结果,比较了两种镀膜在机械性能和结构上的效果.实验结果表明,氮化钛薄膜虽有很高的表面硬度,但其摩擦系数、表面粗糟度比类金刚石膜要高得多.而类金刚石膜虽有很低的摩擦系数和光滑的表面,但表面硬度比氮化钛薄膜小.因此,结合两种膜的优点有可能制备高硬度、耐磨性强、表面光滑的新型复合材料.     

Anisotropic spinodal dewetting as a route to self-assembly of patterned surfaces

The ability to pattern surfaces on a microscopic length scale is of importance for technological applications such as the fabrication of microelectronic circuits and digital storage media. Devices fabricated entirely from polymers are now available, opening up the possibility of adapting polymer processing technologies to fabricate cheap, large-area devices using non-lithographic techniques--for example, by exploiting dewetting and phase separation in thin films. But the final pattern adopted by the polymer film using such approaches requires a template printed onto the substrate by optical lithography, microcontact printing or vapour deposition. Here we describe a simple process for patterning surfaces that does not require a template. Our method involves the spinodal dewetting of a polymer surface by a thin polymer film, in which a liquid film breaks up owing to the amplification of thermal fluctuations in film thickness induced by dispersion forces. A preferred orientation is imposed on the dewetting process simply by rubbing the substrate, and this gives rise to patterns of remarkably well-aligned polymer lines. The width of these lines is well-defined, and is controlled by the magnitude of the dispersion forces at the interface, which in turn can be varied by varying the thickness of the polymer substrate. We expect that further work will make it possible to optimize the degree of order in the final morphology.     

Optical polymer thin films with isotropic and anisotropic nano-corrugated surface topologies

Light reflection from computer monitors, car dashboards and any other optical surface can impair the legibility of displays, degrade transmission of optical components and in some cases may even pose safety hazards. Antireflective coatings are therefore widely used, but existing antireflection technologies often perform sub-optimally or are expensive to implement. Here we present an alternative approach to antireflection coatings, based on an extension of our photo-aligning and photo-patterning technology for liquid-crystal displays (LCDs) and liquid-crystal polymer films with smooth surfaces to optical polymer films with controlled surface topologies. Nano- and micro-corrugated topologies are shown to result from optically induced monomer phase-separation on the polymer surfaces. The properties of the resulting films make them suitable high-performance and low-cost antireflection coatings for optical components of virtually any size, shape and material. Moreover, the approach can be used to form a wide range of other functional polymer thin films with isotropic as well as anisotropic topologies. For example, films can be produced whose optical birefringence exceeds that of the birefringence of the polymer material itself. These new films can also be used as diffractive thin films, diffusers, and directional reflectors which preserve light polarization, or as substrates for aligning liquid crystals to produce bright, low-power-consumption LCDs with integrated optical functions and memory.     

仿生凹坑与纳米碳化硅/镍基复合镀层耦合表面的磨损性能

为了探讨凹坑形态与纳米碳化硅/镍基复合镀层耦合表面的磨损性能,采用激光技术和电沉积技术制备了由凹坑形态和纳米碳化硅/镍基复合镀层构成的仿生耦合表面,并进行了摩擦和磨损试验。结果表明,仿生耦合表面的磨损性能高于单纯复合镀层的磨损性能;随着磨损载荷的增加和磨损时间的延长,试样表面磨损机制由以塑性磨损为主逐渐转变成以粘着磨损、磨粒磨损为主的磨损机制。     

放电电流对热阴极等离子体化学气相沉积金刚石膜影响

建立了快速沉积高品质金刚石膜的热阴极辉光放电等离子体化学气相沉积新方法. 相对于常规冷阴极辉光放电而言,热阴极辉光放电是一种新型放电形式,具有许多新的特性,其中重要一点是具有较高的放电电流(6.0～10.0 A). 较高的放电电流既是热阴极辉光放电本身的突出特点,同时对于化学气相沉积金刚石膜工艺也产生重要影响. 实验研究了放电电流于金刚石膜沉积速率、表面形貌和热导率的影响,发现由于放电电流影响辉光放电的等离子体区和阳极区,进而对金刚石膜的沉积速率和品质有很大影响. 特别是通过放电电流的提高,可以有效地提高金刚石膜的品质,这对于制备优质金刚石膜产品有重大意义.     

LPCVD氮化硅薄膜的制备工艺

氮化硅(Si3N4)薄膜具有许多优良特性,在半导体、微电子和MEMS领域应用广泛.简要介绍了Si3N4膜的制备方法及CVD法制备的Si3N4薄膜的特性,详细介绍了低压化学气相淀积(LPCVD)氮化硅的工艺.通过调整炉温使批量生产的淀积膜的均匀性达到技术要求.     

钕铁硼磁体的AlCl3+LiAlH4有机溶液镀铝研究

研究了钕铁硼磁体在氯化铝和氢化铝锂的四氢呋喃－苯溶液中电镀铝（包括电镀液的制备和磁体的表面处理）,结果表明此方法是钕铁硼磁体有效的防腐蚀手段,并获得了银白色、细晶致密、有良好结合力和防腐蚀性能的铝镀层,测定了磁体镀铝前后的极化曲线     

偏压对电弧镀TiN薄膜结构和机械性能的影响

采用SA-6T电弧离子镀设备在抛光后的W18Cr4V高速钢表面沉积TiN薄膜,在其他参数不变的情况下,考察偏压对薄膜结构和机械性能的影响.通过扫描电镜观察了TiN薄膜的表面形貌,采用X射线衍射仪对结构进行物相分析,利用XP-2台阶仪测试了薄膜的厚度,并用纳米压痕仪和多功能表面测试仪分别对薄膜的硬度和膜基结合力进行测量.结果表明：随着负偏压的增加,具有面心立方结构的TiN薄膜沿（111）密排面的择优生长明显加强;薄膜厚度（沉积速率）呈现先增大后减小的趋势,在负偏压为100V时达到最大;薄膜综合力学性能在负偏压为200V时达到最佳.     

Geometry-dominated fluid adsorption on sculpted solid substrates

The shape and chemical composition of solid surfaces can be controlled at a mesoscopic scale. Exposing such structured substrates to a gas that is close to coexistence with its liquid phase can produce quite distinct adsorption characteristics compared to those of planar systems, which may be important for technologies such as super-repellent surfaces or micro-fluidics. Recent studies have concentrated on the adsorption of liquids on rough and heterogeneous substrates, and the characterization of nanoscopic liquid films. But the fundamental effect of geometry on the adsorption of a fluid from the gas phase has hardly been addressed. Here we present a simple theoretical model which shows that varying the shape of the substrate can exert a profound influence on the adsorption isotherms of liquids. The model smoothly connects wetting and capillary condensation through a number of examples of fluid interfacial phenomena, and opens the possibility of tailoring the adsorption properties of solid substrates by sculpting their surface shape.     

基于反射光谱的InxGa1-xN半导体薄膜厚度测量

氮化镓薄膜是制造蓝紫光光电子器件的理想半导体材料之一。三元合金InGaN薄膜是优良的全光谱材料而且不同In组分的InGaN薄膜叠层可用于研制高效率薄膜太阳电池。精确测量InGaN薄膜的厚度有利于研制高效率的光伏器件。本文利用分光光度计实验研究了蓝宝石衬底金属有机物化学气相沉积（MOCVD）技术生长的铟镓氮（InGaN）半导体薄膜的反射光谱。基于薄膜干涉原理,计算分析了InxGa1-xN薄膜的厚度;结果发现利用反射光谱中不同波峰、波谷确定的薄膜厚度相对偏差度的平均值为4．42％。结果表明用反射光谱的方法测量InxGa1-xN薄膜的厚度是可行的。     

Thin films of porphyrinperylene molecular array fabricated by electrophoresis methodology

Porphyrin-perylene dyad molecular arrays are impor-tant building blocks for mimic photosynthetic systems and molecular opto-electronics such as molecular wires, logic gates and molecular switches. In recent years, Wasielewski’s group[1―3] and Bocian and Lindsey’s group[4―7] have systematically investigated the electronic structure, the mechanism of transient photoinduced charge and/or energy transfer in a few representative porphyrin- perylene arrays, the acquired results threw light on th…