偏压对电弧镀TiN薄膜结构和机械性能的影响

采用SA-6T电弧离子镀设备在抛光后的W18Cr4V高速钢表面沉积TiN薄膜,在其他参数不变的情况下,考察偏压对薄膜结构和机械性能的影响.通过扫描电镜观察了TiN薄膜的表面形貌,采用X射线衍射仪对结构进行物相分析,利用XP-2台阶仪测试了薄膜的厚度,并用纳米压痕仪和多功能表面测试仪分别对薄膜的硬度和膜基结合力进行测量.结果表明：随着负偏压的增加,具有面心立方结构的TiN薄膜沿（111）密排面的择优生长明显加强;薄膜厚度（沉积速率）呈现先增大后减小的趋势,在负偏压为100V时达到最大;薄膜综合力学性能在负偏压为200V时达到最佳.

Effects of negative bias on structure and mechanical properties of TiN coatings by arc ion plating

The SA-6T arc ion plating system was employed to fabricate TiN coatings on the polished high-speed steel substrate W18Cr4V.When the other parameters were fixed,the effects of negative bias applied to the substrate on the structure and mechanical properties of the films were investigated.Scanning electron microscopy(SEM) was adopted to observe the surface morphology,and X-ray diffraction(XRD) was used in characterizing the microstructure of the films.Deposition rate was determined by thickness that was measured by the XP-2 profiler.Hardness and adhesion strength of the films were measured by the nano-indenter and multifunctional tester,respectively.The results show that the as-deposited TiN films are crystalline and tend to be(111) preferred as negative bias increases,and the thickness(i.e.deposition rate since the time used was the same) increases at first then decreases,and reaches the maximum at negative bias of 100 V.The optimized mechanical properties can be obtained at negative bias of 200 V.