含氢类金刚石碳膜的拉曼光谱洛伦兹分解

利用射频等离子体增强化学气相沉积(rf PECVD)工艺在不锈钢基底上制备a-C:H膜,利用激光Raman光谱表征所沉积碳膜的微观结构,特别是通过对拉曼谱图进行洛伦兹分解来评价所沉积碳膜的sp3含量,分析了沉积电压和过渡层对a-C:H膜生长过程及膜中sp3含量的影响.结果表明,利用拉曼光谱的洛伦兹分解能够有效分析a-C:H的结构特性,碳膜沉积过程中沉积电压和过渡层对a-C:H膜的生长均具有重要影响.在本实验条件下,以Ti/TiN/TiC为过渡层沉积电压为2500 V时所制备的a-C:H膜中的sp3含量最高.     

Research on C<Subscript>3</Subscript>N<Subscript>4</Subscript> superhard compound thin film and its application

By combination of DC reactive magnetron sputtering with multiple arcplating, the alternating C₃N₄/TiN compound film is deposited onto HSS. The core level binding energy and the contents of carbon and nitrogen are characterized by X-ray photoelectron spectrum. X-ray diffraction (XRD) shows that compound thin film contains hard crystalline phases of α-C₃N₄ and β-C₃N₄. The Knoop microhardness in the load range of 50, 5–54, 1 GPa is measured. According to acoustic emission scratch test, the critical load values for the coatings on HSS substrates are in the range of 40–80 N. The metal coated with C₃N₄/TiN compound films has a great improvement in the resistance against corrosion. Many tests show that such a coating has a very high wearability. Compared with the uncoated and TiN coated tools, the C₃N₄/TiN coated tools have a much longer cutting life. Foundation item: Supported by the National Natural Science Foundation of China (19875037) Biography: Wu Da-we( (1941-), male, Professor, research direction; thin film and its application.     

A new inorganic azo dye and its thin film: MoO4N4H6

Thin films of hydrazine molybdenum （MoO4N4H6）, a new inorganic azo dye, were synthesized and deposited on a commercial glass substrate using the chemical bath deposition technique. Subsequently, the optical transmission, reflectivity, absorption, refractive index, and dielectric constant of hydrazine molybdenum were investigated using an ultraviolet-visible spectrophotometer. In addition, the film structure was analyzed by mid-infrared spectroscopy. The spectra of the films were found to be in line with those in the literature. The surface properties of all films were examined using a computer-controlled digital scanning electron microscope with a secondary electron detector. The areas of application and the technological advantages of this material were also considered.     

沉积温度对TiN/SiN_x多层膜结构及力学性能的影响

采用反应磁控溅射方法,在不同沉积温度条件下制备了一系列多晶TiN/SiNx纳米多层膜,并用X射线衍射仪（XRD）、X射线反射仪（XRR）及纳米压痕仪（Nanoindenter）表征了材料的微观结构及力学性能。结果表明,沉积温度对多层膜的界面结构、择优取向及力学性能有显著影响：当沉积温度为室温时,多层膜的界面较高温条件下粗糙;而多层膜的择优取向在沉积温度为400℃时呈现强烈的TiN（200）织构;多层膜的硬度及弹性模量在室温至400℃温度范围内变化不大。     

CVD技术在模具上的应用

化学气相沉积(CVD)涂层TiN、Ti(C,N)是提高模具使用寿命的有效途径。本文总结了涂层模具的使用情况,分析了寿命提高的原因。     

Ca~(2+)掺杂对BiFeO_3薄膜结构及光学特性的影响

采用溶胶凝胶法制备Bi1-xCaxFeO3前驱体溶液,利用旋涂的方法在ITO导电玻璃上制备Bi1-xCaxFeO3薄膜样品.用X-射线衍射仪、分光光度计分别对薄膜样品的晶体结构、透射光谱进行测量并利用透射光谱计算出材料的能带带隙.结果表明:所有Bi1-xCaxFeO3样品的主衍射峰与BiFeO3相吻合,具有较好的结晶度和良好的晶体结构,随着Ca2+掺杂量的增加,使BiFeO3样品的主衍射峰(104)与(110)逐渐成为单相峰(110),当Ca2+掺杂量大于0.05时,样品由斜六面体转变为正方晶系.所有样品在430nm~600nm区间形成陡峭的线性吸收边,随着Ca2+掺杂量的增加,吸收峰会发生红移.Ca2+掺杂能提高BiFeO3薄膜在可见光的吸收率.Ca2+掺杂导致BiFeO3薄膜带隙降低的主要原因是样品中的缺陷的数量、表面粗糙度及晶格结构共同作用的结果.     

Influence of post-annealing on the properties of Ta-doped In<Subscript>2</Subscript>O<Subscript>3</Subscript> transparent conductive films

Ta-doped In₂O₃ transparent conductive oxide films were deposited on glass substrates using radio-frequency (RF) sputtering at 300°C. The influence of post-annealing on the structural, morphologic, electrical and optical properties of the films was investigated using X-ray diffraction, field emission scanning electron microscopy, Hall measurements and optical transmission spectroscopy. The obtained films were polycrystalline with a cubic structure and were preferentially oriented in the (222) crystallographic direction. The lowest resistivity, 5.1×10⁻⁴ Ω cm, was obtained in the film annealed at 500°C, which is half of that of the un-annealed film (9.9×10⁻⁴ Ω cm). The average optical transmittance of the films was over 90%. The optical bandgap was found to decrease with increasing annealing temperature.     

Optical properties of cobalt xanthate films on different substrates

Cobalt isopropyl xanthate thin films (CXTFs) were deposited via chemical bath deposition onto different substrates: commercial glass (CG), indium tin oxide (ITO), and poly(methyl methacrylate) (PMM). Isopropyl xanthate was synthesized according to a method described in the literature. The cobalt nitrate and isopropyl xanthate were mixed in a beaker, which allowed the thin films to be deposited via a simple ion-ion mechanism. The transmission, reflectivity, refractive index, dielectric constant, and optical conductivity were investigated for various thin films coated onto different substrates. An ultraviolet-visible spectrophotometer was used to measure the optical properties of the thin films. The lowest value of the transmission and the highest value of the refractive index were observed for the thin films deposited onto PMM. The structure of the cobalt xanthate was characterized by Fourier transform infrared (FTIR) spectroscopy, which was measured using a Perkin-Elmer Spectrum 400 spectrometer. The stretching vibration of the Co-S bonds was observed at 359 cm-1 in the FTIR spectrum of the CXTFs.     

多孔TiO2薄膜的制备及其光催化活性

采用溶胶一凝胶法在玻璃片和玻璃纤维两种基体上制备了多孔TiO2薄膜,对甲基橙水溶液的光催化降解实验表明：在一定范围内,随着TiO2镀层层数的增加,薄膜的光催化活性增强;且相同条件下,以玻璃纤维为基体的薄膜的光催化活性明显优于以玻璃片为基体的薄膜的活性。     

多孔阳极氧化钛反射光学性质的研究

利用直流磁控溅射沉积钛膜,以硫酸为电解液进行不同时间的阳极氧化,获得多孔阳极氧化钛(PATO)薄膜.用X射线衍射仪、扫描子显微镜、原子力显微镜分别表征PATO薄膜的结构和形貌特征,用分光光度计测量样品的反射光谱.结果表明,制得的氧化钛薄膜是多晶的Ti10O18;样品的表面有明显的孔洞结构,且粗糙度随着氧化时间的增加而增大.随着氧化时间从10min增加到40,60,90,120min,样品的颜色相应地由蓝色逐渐过渡到黄色、橙色、紫红色和淡紫色.氧化时间为120min的PATO薄膜的在可见光区的折射率低于2.0,孔隙率约为0.32;粗糙的表面及薄膜内部的孔洞增强了光的散射,导致其消光系数大于0.1.     

Research on C_3N_4 Superhard Compound Thin Film and Its Application

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Effect of TMGa flux on GaN films deposited on Ti coated on glass substrates at low temperature

Highly c-axis-oriented GaN films were deposited on Ti coated glass substrates using low temperature electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition system(ECR-PEMOCVD)with trimethyl gallium(TMGa)as gallium source.The influence of TMGa flux on the properties of GaN films were systematically investigated by reflection high energy electron diffraction(RHEED),X-ray diffraction analysis(XRD),atomic force microscopy(AFM)and Raman scattering.The GaN film with small surface roughness and high c-axis preferred orientation was successfully achieved at the optimized TMGa flux of 1.0 sccm.The ohmic contact characteristic between GaN and Ti layer was clearly demonstrated by the near-linear current-voltage(I-V)curve.The GaN/Ti/glass structure has great potential to dramatically improve the scalability and reduce the cost of solid-state lighting light emitting diodes.     

基体梯度结构对TiN涂层硬质合金抗氧化性能的影响

采用阴极弧蒸发涂层工艺在均质和梯度硬质合金基体上沉积TiN涂层;运用金相观察、XRD检测和SEM分析,研究基体梯度结构对TiN涂层硬质合金抗氧化性能的影响,对涂层硬质合金氧化开裂过程进行分析。研究结果表明:基体结构梯度化后,TiN涂层的表面形貌由平整状变为网状结构;梯度基体表面韧性区的存在提高了TiN涂层硬质合金的抗氧化性能;在800℃氧化2 h后,2种涂层硬质合金边缘开裂,生成大量的氧化物;梯度基体涂层硬质合金开裂程度比均质基体涂层硬质合金的小。     

医用不锈钢表面TiN薄膜的组织结构和力学性能研究

为改善医用不锈钢的耐磨性,采用反应磁控溅射在304不锈钢表面沉积了TiN薄膜,研究了Ti过渡层沉积时间对TiN薄膜微观结构和力学性能的影响。通过Ｘ射线衍射仪、扫描电子显微镜、纳米压痕仪、FST1000型薄膜应力测试仪、HSR-2M摩擦磨损试验机和WS-2005型涂层附着力自动划痕仪对样品进行微观组织表征和力学性能测试。结果表明,当Ti过渡层沉积时间为20 min,Ti过渡层厚度为340 nm时,TiN薄膜结晶性最强,硬度和弹性模量达到最大值,分别为21.6 GPa和327.5 GPa,平均摩擦因数达到最小值0.45,临界载荷达到最大值24.7 N,TiN薄膜的力学性能、摩擦性能以及与基体的结合力达到最优。进一步延长Ti过渡层的沉积时间,TiN薄膜的柱状晶组织粗化、力学性能、摩擦性能以及与基体的结合力均降低。     

物理气相沉积TiN涂层的研究现状与展望

综述了近年来物理气相沉积TiN多元和多层涂层、化学镀Ni—P与PVD和气体氮化与PVD的研究及应用。并指出通过将物理气相沉积与其他表面强化技术结合制取复合涂层及合理的多元、多层设计，可进一步发挥PVDTiN涂层的优势，克服单一TiN涂层的不足。     

Broadband antireflection coatings deposited by magnetron sputtering

Conclusions  

Influence of catalyst on structural and morphological properties of TiO2 nanostructured films prepared by sol–gel on glass

Transparent TiO2 thin films have been prepared by the sol-gel method using titanium alkoxides as precursors.Thin films were deposited on glass supports by the dip-coating technique.The TiO2 layer acts as a self-cleaning coating generated from its photocatalysis and photoinduced superhydrophilicity.The crystalline structure of TiO2 films was dominantly identified as the anatase phase,consisted of uniform spherical particles of about 14-50 nm in size,which strongly depends upon catalyst-type and heat treatment temperature.Increasing heat treating temperature can lead to an increase in crystalline size.The results indicated that the sample S.S(sample derived from sol containing sulfuric acid as catalyst) exhibits superhydrophilic nature and better photocatalytic activity,which can be attributed to its higher anatase content and lower crystalline size.Morphological studies,carried out using Atomic Force Microscopy(AFM),confirm the presence of crystalline phase with such a grain size and low surface roughness.Thus,the applied films exhibiting high photocatalytic activity,superhydrophilic behavior,and low surface roughness can be used as an efficient self-cleaning coating on glass and other optical applications.     

Fabrication of MgB_2 superconducting films by different methods

MgB2 superconducting films have been successfully fabricated on single crystal MgO(111) and c-AL2O3 substrates by different methods. The film deposited by pulsed laser deposition is c-axis oriented with zero resistance transition temperature of 38.4 K, while the other two films fabricated by chemical vapor deposition and electrophoresis are c-axis textured with the zero resistance transition temperature of 38 K and 39 K, respectively. Magnetization hysteresis measurements yield critical current density Jc of 107 A/cm2 at 15 K in zero field for the thin film and of 105 A/cm2 for the thick film. For the thin film deposited by chemical vapor deposition, the microwave surface resistance at 10 K is found to be as low as 100μΩ, which is comparable with that of a high-quality high-temperature superconducting thin film of YBCO.     

电子束蒸发制备的ZnS薄膜的物相结构和光学性能

用电子束蒸发法在不同衬底温度下制备了厚度为100nm左右的ZnS薄膜,利用X射线衍射(XRD)、紫外—可见光分光光度计(UV-vis Spectrophotometer)研究了ZnS薄膜的晶体结构、光学性能,分析了衬底温度对ZnS薄膜结构与光学特性的影响.结果表明:不同衬底温度下制备的ZnS薄膜均具有闪锌矿结构(111)面择优取向生长的特征;衬底温度为200℃时制备的ZnS薄膜的(111)晶面衍射峰最强,半高宽最小,晶粒最大;制备的ZnS薄膜对可见光有良好的透过性,由于量子尺寸效应,电子束蒸发制备的ZnS薄膜光学带隙大于ZnS粉末的带隙.     

Comparison of TiAlN,AlCrN, and AlCrN/TiAlN coatings for cutting-tool applications

Monolayer and bilayer coatings of TiAlN, AlCrN, and AlCrN/TiAlN were deposited onto tungsten carbide inserts using the plasma enhanced physical vapor deposition process. The microstructures of the coatings were characterized using scanning electron microscopy (SEM) and atomic force microscopy (AFM). The SEM micrographs revealed that the AlCrN and AlCrN/TiAlN coatings were uniform and highly dense and contained only a limited number of microvoids. The TiAlN coating was non-uniform and highly porous and contained more micro droplets. The hardness and scratch resistance of the specimens were measured using a nanoindentation tester and scratch tester, respectively. Different phases formed in the coatings were analyzed by X-ray diffraction (XRD). The AlCrN/TiAlN coating exhibited a higher hardness (32.75 GPa), a higher Young’s modulus (561.97 GPa), and superior scratch resistance (L_CN = 46 N) compared to conventional coatings such as TiAlN, AlCrN, and TiN.