Synthesis of CNT film on the surface of micro-pyramid array and its intense pulsed emission characteristics

We developed a new scheme to suppress the electric-field-screening effect in high growth density of a carbon nanotube(CNT) film during its intense pulsed emission.We synthesize the CNT film on a tridimensional surface(t-CNT film).The tridimensional surface includes wet etched silicon pyramids,and the Ni layer is electroless plated thereon.The intense pulsed emission characteristics of the t-CNT and planar-grown CNT(p-CNT) films were measured using a diode structure in single-pulse mode.The even turn-on field decreased from 5.5 V/μm for p-CNTs to 2.8 V/m for t-CNTs,and the peak emission current increased from 232 A for p-CNTs to 324 A for t-CNTs at a peak field intensity ～12.2 V/m.The peak current of the t-CNT film increased by ～39.7% over the p-CNT film.It is clear that the micro-pyramid array can effectively suppress the field screening effect to improve the electron-emission of CNT films.     

胶体石墨涂层的平面场发射特性研究

研究了胶体石墨涂层的场发射特性。测得其相应于10μA/cm²场发射电流密度的开启场强为5.4V/μm,相应于1mA/cm²场发射电流密度的阈值场强为8.8V/μm。扫描电子显微镜观察表明场发射应该来自细小石墨碎片的尖锐边缘。通过计算估计出这些尖锐边缘处的场强比阴阳极之间的平均场强增加了大约4×10²倍。     

六角排列碳纳米管阵列的场增强因子的计算

通过求解Laplace方程得到六角排列的碳纳米管(CNTs)阵列的管尖端电场强度和场增强因子,具体研究CNTs的自身线度、阵列密度及阵列形状对CNTs的场增强因子的影响.研究结果表明,场增强因子随CNTs长径比的增加而增加,对于长径比一定的CNTs阵列,对应着一个最佳阵列密度,如管长为 6 μm、管径分别为5 nm、13 nm、20 nm的CNTs阵列对应的最佳阵列密度为3.05×1011 cm-2、4.83×1010 cm-2、2.12×1010 cm-2.在相同的阵列密度下,六角排列CNTs阵列的场发射性能要优于四方排列的CNTs阵列.计算得到六角排列CNTs阵列上端面的电势分布曲线.     

Well-aligned carbon nanotube array membrane synthesized in porous alumina template by chemical vapor deposition

A new simple approach was devetoped for preparing wetl-aligned and monodispersed carbon nanotube (CNT) array membrane within the cylindrical pores of anodic aluminum oxide (AAO) template by chemical vapor deposition (CVD). Acetylene and hydrogen were used in the CVD process with Fe-catalyzer at 700°C under 250 Pa. Scanning etectron microscope (SEM) and transmission etectron microscope (TEM) were employed to characterize the resulting highly-oriented uniform hollow tube array which had a diameter of about 250 nm, a tube density of 5.3x10⁸ cm² and a length of about 60 μm. The length and diameter of the tubes depend on the thickness and pore diameter of the template. The growth properties of the CNT array film can be achieved by controlling the structure of the template, the particle size of Fe-catalyzer, the temperature in the reactor, the flow ratio and the deposition time. The highly-oriented and uniform CNT array membrane fabricated by this simple method is very much useful in a variety of applications.     

Fabrication and field emission performance of arrays of vacuum microdiodes containing CuO nanowire emitters grown directly on glass without a catalyst

Arrays of vacuum microelectronic sources are fabricated on a glass substrate using cupric oxide (CuO) nanowire emitters. The arrays of electron sources possess a microdiode structure, which can effectively induce field emission and control the delivery of emitted electrons to the anode in a triode-type device operation. A technique for precisely growing CuO nanowires at the centre of microcavities in an array without using a catalyst and at temperatures as low as 400°C is presented. Such a simplified fabrication procedure results in improved field emission performance from the array compared with previous vacuum microelectronic devices. Typical prototype devices have turn-on gate voltages as low as 169 V to give emission current densities of 10 μA/cm2 at the anode. The ratio of anode current to cathode current reaches ~0.85, and the maximum change in emission current density per volt is 1 μA/cm2. Electron emission from the arrays is stable and reproducible under either pulsed or direct current fields. These characteristics indicate that microgate-controlled CuO nanowire emitters may find application in practical devices.     

Field emission characteristics of ZnO nanotetrapods and the effect of thermal annealing in hydrogen

Large-scale tetrapod-like ZnO nanostructures have been synthesized using a thermal chemical vapor deposition method on a silicon substrate. The high-purity nanotetrapods show sharp tips geometry with a wurtzite structure. The field emission properties of the uniform ZnO nanostructural material are investigated at different anode-cathode distances. The turn-on field for the ZnO nanotetrapods is found to be about 3.7 V/μm at a current density of 1 μA/cm^2. The field emission behavior obeys Fowler-Nordheim relationship. More importantly, the field emission properties are improved after annearing in hydrogen, and therefore high emission current and low turn-on field are obtained. These results indicate that tetrapod-like ZnO nanostructures are a promising candidate for cold cathode emitters.     

碳纳米管/纤维阴极场发射平板显示器研制

探索了从碳纳米管/纳米纤维（CNT/CNF）的制备到CNT/CNF阴极场发射平面显示器(c-FED)封装的工艺流程.用化学气相沉积方法,优化制备条件获得了纯度较高的CNT/CNF；以 CNT/CNF和低压荧光粉为原料，采用丝网印刷工艺制作显示器的阴极和阳极；采用类真空荧光显示器的封装工艺封装了c-FED样管.所研制的c-FED具有优良的场发射性能，较好的均匀性及发光密度，黄色荧光粉的c-FED在电场为 2.7 V/μm时的亮度可达600 cd/m².因该显示器使用普通玻璃作为阴阳极基板，整个工艺流程在大面积和实用化方面有很好的应用潜力.      

钨针尖放电处理后的场发射特性

在场发射显微镜（FEM）中使用1万伏以上的电压对钨针尖进行了放电处理。扫描电子显微镜（SEM）和透射电子显微镜（TEM）的观察表明在处理后形成了纳米尺寸的突起。从经过处理的钨针尖能够支取高达1.55mA的场发射电流。针尖的场发射像呈现四重对称,表明它来自单个突起。场发射电流与电压关系符合Fowler-Nordheim (F-N)理论。根据F-N理论算得的场发射面积与TEM下观察到的突起的面积在量级上一致。     

碳纳米管平板显示器有限差分法模拟

采用有限差分法,根据碳纳米管平板显示器的特点选择合适的边界条件,分析了碳纳米管平板显示器内部的电场分布和场增强因子随碳纳米管直径、长度和碳纳米管之间间隔的变化关系。计算结果表明,当碳纳米管之间间隔大于碳纳米管长度3倍时,碳纳米管之间的屏蔽效应可以忽略不计,电场强度和场增强因子随碳纳米管长度增大而线性地增大,当碳纳米管直径较小时,电场强度和场增强因子随碳纳米管直径减小迅速增大。     

First-principles study of the effects of Si doping on geometric and electronic structure of closed carbon nanotube

The effects of Si doping on geometric and electronic structure of closed carbon nanotube （CNT） are studied by, a first-principles method, DMol. It is found that the local density of states at the Fermi level （Er） increases due to the Si-doping and the non-occupied states above the Er go down toward the lower energy range under an external electronic field. In addition, due to the doping of Si, a sub-tip on the CNT cap is formed, which consisted of the Si atom and its neighbor C atoms. From these results it is concluded that Si-doping is beneficial to the CNT field emission properties.     

氮离子轰击改善胶体石墨薄膜平面场发射特性的研究

研究了氮离子(N⁺)轰击对石墨薄膜场发射特性的影响。片层石墨被N⁺轰击成较整齐排列的锥尖阵列,尖端密度～10⁸cm^-2。XPS谱证实有许多N原子注入薄膜,膜内存在大量sp²杂化轨道键。场发射测试表明,经过N⁺轰击,整个薄膜在场发射的均匀一致性方面有较明显的改善,场发射电流密度从0.3增大到1.65mA/cm²。     

掺氮碳纳米管阵列的制备及其场发射特性

使用结构简单的单温炉设备,以二茂铁为碳源与催化剂,三聚氰胺为氮源在硅基底制备出了碳纳米管阵列。所得的碳纳米管为多壁结构,单根碳纳米管的平均直径为50nm,长度为15μm,有着很好的定向性。透射电子显微镜(TEM)和X射线光电子谱(XPS)分析表明所得的碳纳米管是氮掺杂的。利用场发射显微镜研究了掺氮碳纳米管阵列的平面场发射特性,相应的开启场强为1.60V/μm,场发射图像表明了其有较高的场发射点密度。     

多壁碳纳米管薄膜场发射规律实验研究

研究了CVD法定向生长的多壁碳纳米管薄膜的在高电压条件下场发射特性 .我们发现在固定电压条件下发射电流和时间的关系按指数规律减弱 .另一个值得关注的现象是碳纳米管的发射性能的不可恢复性损坏 .电流电压关系也由幂次关系I =aVb 改变为幂次关系I =a(V -V0 ) b′,其中 ,b和b′的值均为 2～ 3.最后讨论了电流减弱的原因     

非定向氧化锌纳米线阵列的场发射

使用热蒸发的方法在硅基底上制备了非定向氧化锌（ZnO）单晶纳米线阵列。经过热蒸发之后,在硅基底上形成一层均匀分布的 ZnO 点。在这些 ZnO 点上生长出非定向的 ZnO 纳米线阵列,其中的纳米线直径大约在 10 到 20nm 之间。考虑到实用,在制备样品的过程中硅基底的温度始终保持在 500℃ 以下。然后测量了这些非定向 ZnO 纳米线阵列的场发射特性。在 5.5V·μm^-1 场强下得到了 10μA·cm^-2 的场发射电流密度;同时使用透明阳极技术观察了其场发射中心的分布。     

氧化锌/银双层膜负反馈阴极电极的制备及性能研究

提出了一种可显著改善碳纳米管(CNTs)场致发射性能的ZnO/Ag双层膜负反馈阴极电极的制备方法.在条形银电极上溅射沉积一定厚度的Zn膜,经热氧化和湿法刻蚀制备成ZnO/Ag双层膜电极.同单层的Ag或氧化铟锡电极相比,该电极不仅具有足够的负反馈电阻(限流电阻)阻止CNTs场发射中过流的发生,而且降低了条形阴极电极的线性电阻,确保了场发射的均匀性.当溅射沉积Zn膜的厚度从40 nm增到120 nm时,热氧化形成的ZnO由孤岛状的颗粒变为连续体的薄膜,ZnO/Ag双层膜电极的表面光洁度比单层的Ag电极有很大的提高,负反馈电阻层的电阻增大,负反馈的能力增强.CNTs薄膜阴极场发射特性曲线证明,ZnO/Ag双层膜电极能明显降低场发射电流的波动,有效提高器件的稳定性和寿命.     

Field emission study of CNTs on metal tips

The field emission characteristics of multiwalled carbon nanotubes grown on metal tips are studied at various temperatures. It is found that emission current at a given applied electric field increased with the temperature, and the stability of the current did not change. The dependence upon temperature varies quite differently with the metal substrates. This may result from the asymmetry of the CNTs and the interface effect between CNT and underlay.     

放电处理高分子薄膜场致发射阴极的研究

考察了聚苯胺（PANI—CSA）、聚对苯乙烯磺酸（PEDOT）、聚乙烯咔唑（PVK）和聚甲基丙烯酸甲酯（PMMA）4种高分子薄膜经放电处理后的场致电子发射性能．首先将这些材料配制成溶液分别在ITO玻璃衬底上旋涂成膜,放入真空测试箱中,通过放电处理这些薄膜的表面;再将处理好的薄膜作为阴极发射体．文中比较了这些薄膜的场致发射阈值电压、电流一电压特性曲线以及相应的福勒一诺德海姆（F-N）曲线,测试了这4种高分子薄膜的电导率,比较电导率对放电处理结果的影响．实验证明,电场作用下高分子薄膜的电子发射能力和电导率有关,具较高电导率的高分子薄膜经表面放电处理后其发射能力更强．     

CdSe纳米棒阵列的制备及其光电化学性能

在室温条件下, 用电化学沉积方法在铟锡氧化物(ITO)基底表面生长CdSe纳米棒阵列, 并利用X射线衍射(XRD)、 能量色散X射线(EDX)、 场发射扫描电子显微镜(
FESEM)和紫外 可见吸收光谱(UV Vis)表征CdSe纳米棒阵列的晶体结构和表面形貌, 考察其光电化学性能; 在标准三电极体系下, 测试CdSe纳米棒阵列电极的光电化学性能. 结果表明： 样品沿\[001\]方向择优生长, 并具有明显的光响应特性; 在光强为100 mW/cm² 的模拟太阳光照射下, 该电极光电流密度     

Field Emission of SiCN Thin Films Bombarded by Ar~+ Ions

0　IntroductionInthefieldofvacuummicroelectronicdevices,coldcathodeelectronfieldemittersarepotentiallyusefulforfieldemissiondisplays (FED) .FEDareimportantelementsoftheflatpaneldisplays.Comparingwithliquidcrystaldisplays (LCD)andcath oderaytube (CRT)displays,ithasacompactsize ,alargeview ingangle ,excellentbrightnessandhighpicturequality[1 ] .Muchresearchhasbeenperformedtounderstandandimprovethefieldemissionpropertiesofthinfilmsandthinfilmstructures.Withthedevelopmentsofvacuummicroelectro…     

视觉假体铂铱合金微电极阵列的电场分析

采用有限元法研究用于视神经视觉假体铂铱合金微电极阵列的电场分布情况,在单极和双极电流刺激条件下,分析不同长度微电极的空间电场分布,通过在体动物实验验证了铂铱合金微电极阵列在体工作的有效性.结果表明,经过100μA的单极和双极电流刺激后,铂铱合金电极的最大电场强度均发生在电极材料和绝缘材料的交界处.以电场强度最大点为原点,单极和双极电流刺激的有效半径分别约为21和24μm.