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氮离子轰击改善胶体石墨薄膜平面场发射特性的研究
引用本文:王玮玮,孙辉,于利刚,张耿民.氮离子轰击改善胶体石墨薄膜平面场发射特性的研究[J].北京大学学报(自然科学版),2007,43(3):412-416.
作者姓名:王玮玮  孙辉  于利刚  张耿民
作者单位:北京大学信息科学技术学院电子学系,北京,100871
摘    要:研究了氮离子(N )轰击对石墨薄膜场发射特性的影响.片层石墨被N 轰击成较整齐排列的锥尖阵列,尖端密度~108cm -2.XPS谱证实有许多N原子注入薄膜,膜内存在大量sp2杂化轨道键.场发射测试表明,经过N 轰击,整个薄膜在场发射的均匀一致性方面有较明显的改善,场发射电流密度从0.3增大到1.65mA/cm2.

关 键 词:氮离子(N  )  溅射轰击  石墨  场发射阵列
修稿时间:2006-04-272006-09-04

Improving the Field Emission Properties of a Graphite Paste Film by Nitrogen Ion Bombardment
WANG Weiwei,SUN Hui,YU Ligang,ZHANG Gengmin.Improving the Field Emission Properties of a Graphite Paste Film by Nitrogen Ion Bombardment[J].Acta Scientiarum Naturalium Universitatis Pekinensis,2007,43(3):412-416.
Authors:WANG Weiwei  SUN Hui  YU Ligang  ZHANG Gengmin
Institution:Key Laboratory for the Physics and Chemistry of Nanodevices and Department of Electronics, Peking University, Beijing, 100871
Abstract:The field emission properties of a graphite paste film were found to have been greatly improved by nitrogen ion bombardment. The bombardment transformed the graphite surface into an array of graphite cones with a - 10^8 cm^-2 tip density. XPS measurement showed that plenty of nitrogen had been injected into the graphite film and there existed a large number of sp2 bonds. Field emission test demonstrated that the distribution of the emission sites in the post-bombardment film was much more dense and uniform than that of the original one. The maximum current density of 1.65 mA/cm^2 was also achieved, which was much higher than that of the pre-treatment sample.
Keywords:N-ion  bombardment  graphite  field emission array
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