Field Emission of SiCN Thin Films Bombarded by Ar~+ Ions

0　IntroductionInthefieldofvacuummicroelectronicdevices,coldcathodeelectronfieldemittersarepotentiallyusefulforfieldemissiondisplays (FED) .FEDareimportantelementsoftheflatpaneldisplays.Comparingwithliquidcrystaldisplays (LCD)andcath oderaytube (CRT)displays,ithasacompactsize ,alargeview ingangle ,excellentbrightnessandhighpicturequality[1 ] .Muchresearchhasbeenperformedtounderstandandimprovethefieldemissionpropertiesofthinfilmsandthinfilmstructures.Withthedevelopmentsofvacuummicroelectro…     

富氧条件下NO_x的选择催化还原:载体与活性组分的影响

考察了不同载体 ,如微孔沸石 P、ZSM- 5和 Beta,中孔材料 MCM- 41以及 γ- Al2 O3 等负载Co催化剂在富氧条件下对丙烷选择性催化 NOx 还原的活性 .用 N2 吸附等温线、程序升温还原( TPR)及 X光光电子能谱 ( XPS)等方法表征了载体的孔结构和 Co的化学态并与反应活性关联 .结果表明 :载体的结构和孔道以及 Co组分的化学态决定了 NOx 选择催化还原活性 ,催化剂对 NOx催化转化活性次序如下 :Co/Beta>Co/ZSM- 5 Co/P≌ Co/γ- Al2 O3 >Co/MCM- 41 ,适宜的孔径以及保持 Co组分在孔道内为 Co2 + 结构是 Co/Beta活性最高的主要原因     

铁观音茶梗对废水中Cr(Ⅵ)的还原吸附

通过单因素实验,研究了铁观音茶梗作为一种新型吸附剂,将水体中毒性极强的重金属Cr(Ⅵ)还原为低毒性甚至无毒的Cr(Ⅲ)的去除效果。通过吸附等温模型和吸附动力学模型对试验参数进行拟合,并通过SEM、BET、FTIR、XPS等多种表征方法对吸附机理进行探讨。结果表明:茶梗粒径越大、投加量越多,pH≤11时,茶梗对Cr(Ⅵ)都有较高的去除率;且共存离子Ca(Ⅱ)和Ni(Ⅱ)对茶梗还原吸附Cr(Ⅵ)的影响很小。吸附过程较好地符合Freundlich吸附等温模型和准二级动力学模型。一定条件下,铁观音茶梗、普洱茶茶梗、甲醛改性茶梗对Cr(Ⅵ)的去除效果优于活性炭。表征结果证明茶梗主要通过还原吸附作用去除水中的Cr(Ⅵ),羟基、氨基和酰基等活性基团参与了Cr(Ⅵ)的还原吸附。     

复合固体超强酸催化剂WO_3-ZrO_2-SO_4~(2-)的研究(Ⅱ)——晶体结构及其表面结构

复合固体超强酸催化剂 WO_3-ZrO_2-SO_4~(2-)具有 H_0≤-16.04的酸强度,XRD 研究证明其具有四方晶体结构,各组分间形成混合物;XPS 和 AES 研究发现 W(+6),Zr(+4),S(+6)和 O(-2)之间存在强的相互作用,红外光谱研究表明其存在 OH 基,表现强的 B 酸性,表面附载硫具有和金属离子螯合配位的结构形式.     

制备CFC替代品氟化催化剂的XPS研究

对氟化催化剂在不同气氛下焙烧进行了研究。XPS结果表明：不同气氛下形成了不同组成的铬物种。     

化学改性二氧化锰结构表征

应用扩展X射线精细结构（EXAFS）技术及光电子能谱研究改性MnO2的结构,结果表明：掺杂原子进入了MnO2晶格中,锰的第一壳层配位数下降,并且增大高壳层配位原子的无序度。     

The preparation and characterization of amorphous SiCN thin films

Radio Frequency plasma enhanced Chemical Vapor Deposition (RF CVD) using N₂, SiH₄ and C₂H₄ as the reaction sources was used to prepare amorphous ternary Si _x C _y N _z thin films. The chemical states of the C, Si and N atoms in the films were characterized by X-ray photoelectron spectroscopy (XPS) and Fourier Transform Infrared Spectroscopy (FTIR). The refractive indexn, extinction coefficientk and optical band gapE _opt of the thin films were investigated by UV-visible spectrophotometer and spectroscopic ellipsometer. The results show that a complex chemical bonding network rather than a simple mixture of Si₃N₄, SiC, CN _x and a-C etc., may exist in the ternary thin films. Then's of the films are within the range of 1. 90–2. 45, andE _opt's of all samples are within the range of 2. 71–2. 86 eV. Foundation item: Supported by the National Natural Science Foundation of China (19975035) Biography: Li Jin-chai (1946-), male, Professor, research direction: novel functional materials films & ion beam modification of materials.     

用XPS技术表征Er(Ⅲ)二元和三元配合物

二元配合物ErL-3（L=吲哚-3-乙酸,吲哚-3-丙酸,吲哚-3-丁酸）中,羧基的两个氧原子与Er（Ⅲ）双齿配位.三元配合物ErL3· phen中,3个配体吲哚酸分子有部分（1或2个吲哚酸分子）以双齿配位,其它吲哚酸分子以 单齿配位.吲哚环中的氮原子未参加配位,邻菲G86AA啉分子中的两个氮原子参加配位.     

镧系元素六氟磷酸盐二乙基亚砜配合物的合成表征及X—光电子能谱研究

本研究了未见报道的含非配位阴离子（PF6^-)的镧系二乙基亚砜（DESO）配合物。研究了它们的组成、IR、X－ray粉末衍射精、XPS以及摩尔电导等性质。确定了它们的组成为Ln(DESO)n(PF6)3,术中Ln=La时,n＝7．5;Ln=Ce-Lu、Y时,n=7。亚砜通过氧原子配位,PF6^-为非配位阴离子。     

The first observation of Mo5+ in the passivation layer of Mo2N

Molybdenum nitride powder with S_g of 115 m² · g¹ (passivated) has been prepared by a temperature programmed reaction of MoO₃in H₂/N₂ mixture. It exhibited high catalytic activity in CO oxidation at low temperature. XPS, EPR and LRS studies have shown the existence of mixed valence states of Mo ions, especially Mo⁵⁺ ion (g(tT=1.932,g||=1.892) observed for the first time, in the passivation layer of molybdenum nitride. A surface Superoxide species, O₂ (g = 2.001, Raman band 1 124 cm¹), was found to be produced accompanying the transformation of Mo⁵⁺/Mo⁴⁺ redox pair. Evidence has been given to suggest that this surface superoxide might be responsible for CO oxidation over Mo₂N catalyst.