| 光敏聚酰亚胺合成的新途径(Ⅰ)聚酰胺的氯甲基化反应 |
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| 引用本文： | 张爱清,李香丹,青志保,Lee Myong-Hoon.光敏聚酰亚胺合成的新途径(Ⅰ)聚酰胺的氯甲基化反应[J].中南民族大学学报(自然科学版),2002,21(4):5-9. |
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| 作者姓名： | 张爱清 李香丹 青志保 Lee Myong-Hoon |
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| 作者单位： | [1]CollegeofChemAndLifeScience,SCUFN [2]DeptofPolymerScienceandTechnology,ChonbukNationalUniversity,664－1,Dukjin,Chonju,Chonbuk5610756,Korea |
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| 摘 要： | 采用可溶性聚酰亚胺，经过氯甲基化反应，得到了聚酰亚胺改性的起始原料－氯甲基化聚酰亚胺。该聚合物的结构采用^1H-NMR和FT－IR得到了确认，最高氯甲基化率为181％，该聚合物溶于氯仿和四氢呋喃等溶剂。
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| 关 键 词： | 聚酰胺 氯甲基化反应 聚酰亚胺 改性 合成方法 光敏性 |
Novel Synthesis of Photosensitive Polyimides (Ⅰ) Chloromethylation of Polyimides |
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| Lee Myong-Hoon.Novel Synthesis of Photosensitive Polyimides (Ⅰ) Chloromethylation of Polyimides[J].Journal of South-Central Univ for,2002,21(4):5-9. |
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| Authors: | Lee Myong-Hoon |
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| Abstract: | Soluble aromatic polyimide was chloromethylated via reaction with chloromethyl methyl ether in the presence of tin(Ⅳ) chloride to produce a new starting material for modification of aromatic polyimides. Chemical structure of the resulting polymer was confirmed by 1H-NMR and FT-IR spectroscopy. The maximum degree of chloromethylation was 181%. Chloromethylated polyimide was stable up to 250 ℃, and soluble in chloroform and THF. |
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| Keywords: | chloromethylation polyimide modification |
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