电流密度影响下镍钨合金电沉积层的组成、结构和形貌

采用分光光度法、Ｘ射线衍射和金相显微镜等方法研究在焦磷酸盐体系中，电流密度影响下所获得的Ｎｉ－Ｗ合金电沉积层的组成、结构和表面形态．结果表明，随着电流密度的提高，合金沉积层中的Ｗ含量增大；形成置换固溶体的合金沉积层晶格参数涨大、晶格畸变度增大、而显微晶粒尺寸减小；合金沉积层的电结晶生长形态均呈现整齐的团粒状生长特征．讨论了上述实验结果．

Effect of Current Density on the Composition, Structure and Morphology of Ni-W Alloy Electrodeposit

The effect of current density on the composition, structure and morphology of Ni W alloy electrodeposit obtained in pyrophosphate bath were studied by the methods of spectrophotometry, X ray diffraction and metallurgical microscope. The results show that, by the increment of the cathodic current density,the alloy electrodeposit was formed in displacemental solid solution, and that, with W content raised,lattice parameter expanded,and lattice distortion increased, whereas grain size decreased. All the morphologies of the deposits were presented in neat granular structure in the growth of electrocrystallization. The results were discussed.