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掺杂对锗纳米晶薄膜电输运的影响
引用本文:张盛华,卢铁城,敦少博,胡强,赵建君,何捷.掺杂对锗纳米晶薄膜电输运的影响[J].汕头大学学报(自然科学版),2007,22(2):47-52.
作者姓名:张盛华  卢铁城  敦少博  胡强  赵建君  何捷
作者单位:1. 桂林医学院物理教研室,广西,桂林,541004;四川大学物理系辐射物理及技术教育部重点实验室,成都,610064
2. 四川大学物理系辐射物理及技术教育部重点实验室,成都,610064
摘    要:利用离子注入然后退火的方法制备镶嵌有锗纳米晶的二氧化硅复合膜,再利用中子嬗变方法,对镶嵌有锗纳米晶的二氧化硅复合膜进行精确均匀掺杂,用激光拉曼散射测量表征锗纳米晶的存在,测量嬗变掺杂前后样品的I-U曲线和lnR-1/T曲线.结果表明:掺杂样品未退火时电阻极大,退火后电阻明显减小,但比未掺杂时大;其它条件相同时,锗的注入量越大,纳米晶层的电阻越小;在掺杂样品的低温I-U曲线中发现台阶.

关 键 词:锗纳米晶  中子嬗变掺杂  电输运
文章编号:1001-4217(2007)02-0047-06
收稿时间:2007-01-22
修稿时间:2007-01-22

Effect of Doping on Electron-Transport Properties of Ge Nanocrystals Embedded Structure
ZHANG Sheng-hua,LU Tie-cheng,DUN Shao-bo,HU Qiang,ZHAO Jian-jun,HE Jie.Effect of Doping on Electron-Transport Properties of Ge Nanocrystals Embedded Structure[J].Journal of Shantou University(Natural Science Edition),2007,22(2):47-52.
Authors:ZHANG Sheng-hua  LU Tie-cheng  DUN Shao-bo  HU Qiang  ZHAO Jian-jun  HE Jie
Institution:1. Physics Department, Guilin Medical College, Guilin 541004, Guangxi, China; 2. Key Laboratory. of Ministry of Education for Irradiation Physics Technology, Department of Physics, Sichuan University, Chengdu 610064, Sichuan, China
Abstract:Ge nanocrystals samples were fabricated by Ge ion implantation and subsequent annealing.The sample was doped precisely and homogeneously with neutron transmutation doping(NTD).Ge nanocrystals were measured by Laser Raman scattering.The I-U curve and lnR-1/T curve of them were measured,and the related Electron-Transport properties of doping sample were studied.The results indicate that the resistance of doping sample is extremely large before annealed and the resistance is decreased after sample annealed but is also larger than the resistance of undoped and annealed.In addition,the resistance of doping sample is decreased with increasing injecting quantity.A step structure is observed in the I-U curve of doped sample at low temperature.
Keywords:Ge nanoerystals  neutron transmutation doping  electron-transport
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