Reaction behavior of trace oxygen during combustion of falling FeSi75 powder in a nitrogen flow

To explore the reaction behavior of trace oxygen during the flash combustion process of falling FeSi75 powder in a nitrogen flow, a flash-combustion-synthesized Fe-Si₃N₄ sample was heat-treated to remove SiO₂. The samples before and after the treatment were investigated by X-ray diffraction, scanning electron microscopy, and transmission electron microscopy, and the formation mechanism of SiO₂ was investigated. The results show that SiO₂ in the Fe-Si₃N₄ is mainly located on the surface or around the Si₃N₄ particles in dense areas, existing in both crystalline and amorphous states; when the FeSi75 particles, which are less than 0.074 mm in size, fell in up-flowing hot N₂ stream, trace oxygen in the N₂ stream did not significantly hinder the nitridation of FeSi75 particles as it was consumed by the surface oxidation of the generated Si₃N₄ particles to form SiO₂. At the reaction zone, the oxidation of Si₃N₄ particles decreased the oxygen partial pressure in the N₂ stream and greatly reduced the opportunity for FeSi75 particles to be oxidized into SiO₂; by virtue of the SiO₂ film developed on the surface, the Si₃N₄ particles adhered to each other and formed dense areas in the material.

Reaction behavior of trace oxygen during combustion of falling FeSi75 powder in a nitrogen flow

To explore the reaction behavior of trace oxygen during the flash combustion process of falling FeSi75 powder in a nitrogen flow, a flash-combustion-synthesized Fe-Si3N4 sample was heat-treated to remove SiO2. The samples before and after the treatment were investi-gated by X-ray diffraction, scanning electron microscopy, and transmission electron microscopy, and the formation mechanism of SiO2 was investigated. The results show that SiO2 in the Fe-Si3N4 is mainly located on the surface or around the Si3N4 particles in dense areas, existing in both crystalline and amorphous states;when the FeSi75 particles, which are less than 0.074 mm in size, fell in up-flowing hot N2 stream, trace oxygen in the N2 stream did not significantly hinder the nitridation of FeSi75 particles as it was consumed by the surface oxidation of the generated Si3N4 particles to form SiO2. At the reaction zone, the oxidation of Si3N4 particles decreased the oxygen partial pressure in the N2 stream and greatly reduced the opportunity for FeSi75 particles to be oxidized into SiO2;by virtue of the SiO2 film developed on the sur-face, the Si3N4 particles adhered to each other and formed dense areas in the material.