| 等离子辅助镀光学薄膜的研究 |
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| 引用本文： | 杜旭日,郭亨群.等离子辅助镀光学薄膜的研究[J].华侨大学学报(自然科学版),2001,22(1):31-34. |
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| 作者姓名： | 杜旭日 郭亨群 |
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| 作者单位： | 华侨大学信息科学与工程学院, |
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| 基金项目： | 福建省自然科学基金资助项目 |
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| 摘 要： | 研究用等离子辅助镀技术，制备3种氧化物光学薄膜，透射光谱实验表明，该薄膜透明度好，吸收损耗小，具有优良的光学特性，经表面形貌探讨，说明等离子辅助镀技术可得到较为致密平整的薄膜，而新型等离子体源，能有效地改善光学薄膜的特性，具有实际应用的价值。
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| 关 键 词： | 等离子辅助镀 等离子体源 氧化物光学薄膜 透明度 吸收损耗 光学特性 |
| 文章编号： | 1000-5013(2001)01-031-04 |
| 修稿时间： | 2000年7月31日 |
A Study on Optical Film Prepared by Plasma-Aided Plating |
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| Du Xuri,Guo Hengqun.A Study on Optical Film Prepared by Plasma-Aided Plating[J].Journal of Huaqiao University(Natural Science),2001,22(1):31-34. |
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| Authors: | Du Xuri Guo Hengqun |
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| Abstract: | A study is made on the optical films of three oxides prepared by the technique of plasma aided plating. The film is good in transparency, small in absorption loss and excellent in optical character, as shown by experiment of transmission spectrum. A fairly compact and even film can be obtained by this technique, as shown by study of surface state. This new type plasma source is able to improve characteristic of optical film effectively. It has the value of practical application. |
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| Keywords: | plasma aided plating optical film plasma source |
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