| Cu掺杂对ZnO纳米薄膜的结构及其光学特性的影响 |
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| 引用本文： | 马书懿,毛雷鸣,马慧,史新福,周婷婷,丁继军.Cu掺杂对ZnO纳米薄膜的结构及其光学特性的影响[J].西北师范大学学报,2010,46(1):37-42. |
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| 作者姓名： | 马书懿 毛雷鸣 马慧 史新福 周婷婷 丁继军 |
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| 作者单位： | [1]西北师范大学物理与电子工程学院,甘肃兰州730070 [2]巢湖学院物理与电子科学系,安徽巢湖238000 |
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| 基金项目： | 国家自然科学基金，甘肃省自然科学基金，甘肃省高分子材料重点实验室开放基金 |
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| 摘 要： | 采用磁控溅射法(RF)在玻璃基底上制备了未掺杂和不同Cu掺杂浓度的ZnO薄膜.使用X射线衍射仪(XRD)、原子力显微镜(AFM)、扫描电子显微镜(SEM)分别对样品的形貌进行了表征,并对ZnO薄膜进行了应力分析.结果显示:所有样品都呈现出(002)衍射峰,有较好的c轴择优取向;所有样品出现有3个发光峰,分别对应于400 nm(3.14 eV,紫光),444 nm(2.78 eV,蓝光),484 nm(2.56 eV,蓝光).紫峰的存在与激子的存在有极大关系,而蓝光发射主要是由于电子从导带上向锌空位形成的浅受主能级上的跃迁.随着Cu掺杂量的增加,薄膜的带隙宽度Eg随之减小,样品光学带隙值由3.26 eV逐渐减小为2.99 eV.实验中还发现,随着Cu掺杂量增加,薄膜的透射率也随之减小.
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| 关 键 词： | AFM 光致发光 Cu掺杂ZnO薄膜 光学带隙 透射 |
Study of structure and optical properties of Cu-doped ZnO nanofilms prepared by RF magnetron sputtering |
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| MA Shu-yi,MAO Lei-ming,MA hui,SHI Xin-fu,ZHOU Ting-ting,DING Ji-jun.Study of structure and optical properties of Cu-doped ZnO nanofilms prepared by RF magnetron sputtering[J].Journal of Northwest Normal University Natural Science (Bimonthly),2010,46(1):37-42. |
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| Authors: | MA Shu-yi MAO Lei-ming MA hui SHI Xin-fu ZHOU Ting-ting DING Ji-jun |
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| Institution: | MA Shu-yi1,MAO Lei-ming1,MA hui2,SHI Xin-fu1,ZHOU Ting-ting1,DING Ji-jun1(1.College of Physics , Electronic Engineering,Northwest Normal University,Lanzhou 730070,Gansu,China,2.Department of Physics , Electronic Technology,Chaohu University,Chaohu 238000,Anhui,China) |
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| Abstract: | ZnO films doped with different Cu concentration are prepared on glass substrate by RF magnetron sputtering system.The structural and morphology of the samples are investigated by X-ray diffraction(XRD),atomic force microscopy(AFM)and scanning electron microscopy(SEM),and the stress in the ZnO thin films is analyzed.The results show that all the samples have a strong diffraction peak and high preferential orientation in the(002)crystallographic direction.Three peaks have been observed from the PL spectra of ... |
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| Keywords: | AFM |
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