基于正电子湮没寿命谱研究Fe-6.5wt.%Si合金中热空位的生成

正电子湮没技术（PAT）是一种无损伤的材料探测技术,它可以反映正电子所在处电子密度或电子动量分布的信息.由于正电子对原子尺度的缺陷非常敏感,所以正电子湮没技术（PAT）是研究纯金属及金属间化合物中热空位生成的有效工具.基于正电子寿命谱技术对金属间化合物Fe-6.5wt.%Si合金热轧板在不同温度退火后缺陷变化进行研究,发现了正电子平均寿命在673K左右迅速增加,673至1073K温度范围内平均正电子寿命的温度曲线为明显的S形状,1073K以上平均正电子寿命趋于常数,通过分析正电子平均寿命的温度变化曲线,得到了Fe-6.5wt.%Si合金中热空位生成的临界温度值,并计算得到了该合金的空位生成激活焓为HVF=0.54eV.     

含V和Cu的TiAl基合金中缺陷和3d电子行为的正电子湮没研究

通过测量过渡金属元素（Ti,V,Cu）以及TiAl基合金（Ti5A150,Ti50A148V2,Ti5A148Cu2）的符合正电子湮没辐射多普勒展宽谱和寿命谱,获得了这些金属及合金中3d电子和缺陷的信息．结果表明,过渡金属元素Ti,V,Cu原子中3d轨道的电子数目越多,正电子湮没辐射Doppler展宽谱的3d信号越强．二元TiAl合金的电子密度和3d电子的信号较低,晶界缺陷的开空间较大．在TiAl合金中加入V或Cu,合金中的3d电子信号增强,基体和晶界处的电子密度均增加．Ti,A148cu2合金的多普勒展宽谱的3d电子信号高于Ti50Al48V2合金．     

锰氧化物La0.67Ca0.33Mn0.9A0.1O3的正电子湮没研究

采用固相反应法制备了La0.67Ca0.33Mn0.9A0.1O3(其中A为Cr、Co、Fe、Al、Cu)系列Mn位替代的氧化物样品;利用正电子湮没对该系列样品的结构缺陷进行了分析,结果表明:τ1的变化范围不大,表明样品主要受大尺寸点缺陷的影响,τ2的变化比较明显,说明样品内存在一定数量的空洞及微空洞等缺陷.类比合金中正电子长寿命与缺陷簇之间的关系,估算了元素替代后样品的缺陷半径大小,可能大的空位团簇、位错和晶界在样品中起着重要作用.按Cr、Co、Fe、Al、Cu的掺杂顺序,平均寿命τavg逐渐增加,而电子密度ne则逐渐减小.说明元素掺杂引起锰离子局域环境的改变,样品中的铁磁与反铁磁作用的相互竞争及样品内部电子局域化所形成的极化行为等因素的影响,导致了正电子寿命各参数的变化.     

聚合物共混体系的正电子湮没研究

用正电子湮没寿命谱仪对聚丙烯PP和三元乙丙橡胶EPDM的共混体系进行了测量.实验研究表明,正电子湮没寿命灵敏地反映了在95—370K温度范围内PP/EPDM共混物的微观结构变化.经分析得到PP/EPDM是两相共混体系的结论.     

Fe-基形状记忆合金不同预应变量下的正电子湮没寿命谱研究

利用正电子湮没寿命谱研究了几种不同成分Ｆｅ基形状记忆合金预应变过程中缺陷结构的变化，并讨论了这一变化对合金形状记忆效应的影响     

钆掺杂巨磁阻材料Sr_2FeMoO_6正电子湮没谱

采用固相反应法成功制备了钆掺杂样品Sr2-xGdxFeMoO6(x=0,0.05,0.1,0.15,0.2).X射线衍射对样品的检测结果表明,在整个掺杂范围内样品单相性很好;利用正电子湮没技术对样品缺陷进行了研究,掺杂使微缺陷复合成大的空位团,导致缺陷尺寸变大;采用标准四引线法测量了样品电阻率随温度变化,反位缺陷、缺陷尺寸及GdFeO3和GdMoO3团簇是影响样品电阻率的重要因素.     

PET低温自由体积特征的正电子谱学研究

应用正电子湮没技术，测量了ＰＥＴ（聚对苯二甲酸乙二脂）在不同温度下的正电子湮没寿命谱。使用正电子寿命谱的离散分法（ＰＡＴＦＩＴ），根据正电子湮没参数随温度的变化，两个次级转变点Ｔβ和Ｔγ被确定。利用最新发展的连续谱的分析程序（ＭＥＬＴ），得到几种不同温度下的自由体积的分布，发现低温下自由体积大小，数量及分布并非常量，同时发现在极低温（３０Ｋ）下，自由体积的分布很宽。     

金属微粒—介质复合薄膜（Ag—BaO）的正电子湮没寿命实验

以真空蒸发方式制备的金属微粒－介质复合薄膜，会存在各种不同的微观结构缺陷，为研究它的这种缺陷，制备了Ａｇ微粒－介质（ＢａＯ）复合薄膜，并在不同温度下退火，对这些样品做了正电子湮没有寿命实验，结果发现随退火温度升高正电子湮没平均寿命减少，这是因为表征金属微粒与介质之间界面状况的缺陷退火而得到改善。     

α-Fe充氢热稳定性的正电子湮没研究

用正电子湮没技术测得了两组驱氢后试样的多谱勒加宽参数S随驱氢温度T变化的曲线。结果表明,两组试样的S～T曲线均存在三个S极小值,三个极小值温度分别对应氢从晶界、位错和微空洞处释放,并计算得到了氢从各类缺陷处的释放激活能E_(?)。     

W-K合金中空位型缺陷的浓度和尺寸研究

W-K合金具有熔点高,抗热冲击性能强,抗氢氦等离子辐照能力强等众多优点,特别是钾泡的形成能稳定晶界、充当钉扎点和细化晶粒的作用,从而改善了W-K合金材料的性能.由于正电子寿命谱分析技术对纳米尺度的空位型缺陷极为敏感,因此本文采用该方法测量了正电子在不同钾含量下W-K合金的寿命值大小和相应的强度,并依据正电子湮没的两态捕获模型,对拟合的正电子寿命成分进行数据处理,同时对钾泡浓度和尺寸的变化情况进行了分析和讨论.     

正电子谱学技术在功能材料微结构表征中的应用

特殊功能材料是一些具有优良电学、磁学、学、热学、学、力学、化学、物医学功能,在各类高科技领域到泛应用.正电子湮没技术是一种对材料微结构特别有效探测技术,特别是对各种缺陷、空位和微孔尤为灵敏,通过正电子湮没寿命谱、多普勒展宽谱和慢正电子束技术,通过分析正电子湮没参数可以获材料从表面到内部缺陷分布信息和随外部物理和化学条件变化、引起微结构变化.本文选取几种特殊材料正电子湮没实验结果来分析材料内部微结构,表明正电子湮没谱学是一种独特研究微观结构方法.     

Gas-phase hydrogenation influence on defect behavior in titanium-based hydrogen-storage material

Titanium and its alloys are promising materials for hydrogen storage. However, hydrogen penetration accompanies the exploitation of hydrogen storage alloys. In particular, hydrogen penetration and accumulation in titanium alloys changes their mechanical properties. Therefore, the research works of such materials are mainly focused on improving the reversibility of hydrogen absorption-liberation processes, increasing the thermodynamic characteristics of the alloys, and augmenting their hydrogen storage capacity. In the process of hydrogenation-dehydrogenation, the formed defects both significantly reduce hydrogen storage capacity and can also be used to create effective traps for hydrogen. Therefore, the investigation of hydrogen interaction with structural defects in titanium and its alloys is very important. The present work, the hydrogen-induced formation of defects in the alloys of commercially pure titanium under temperature gas-phase hydrogenation(873 K) has studied by positron lifetime spectroscopy and Doppler broadening spectroscopy. Based on the evolution of positron annihilation parameters τ_f, τ_d, their corresponding intensities If, Idand relative changes of parameters S/S_0 and W/W_0, the peculiarities of hydrogen interaction with titanium lattice defects were investigated in a wide range of hydrogen concentrations from 0.8at% to 32.0at%.     

非掺杂半绝缘态InP中补偿缺陷正电子寿命谱的研究

作者利用正电子湮灭寿命谱(PAL)、光激电流瞬态谱(PICTS)及Hall效应,研究了非掺杂半绝缘(SI)InP中补偿缺陷的形成,即在磷化铁(IP)及纯磷(PP)气氛下不同退火条件时其缺陷的发展变化,从而探讨原生非掺InP形成SI态的机制.实验的原始材料都是用液封直拉法(LEC)生长的n型非掺InP.对原生InP,铟空位VIn及与之相关的缺陷是主要的正电子捕获陷阱,VInH4复合体是使材料成为n型材料的原因.在IP SI-InP的形成中,Fe原子扩散进入VIn,可产生替位的补偿缺陷FeIn,Fe的扩散压制     

Defects in NTD InP probed by positron annihilation spectroscopy

Two samples of high purity InP extracted from the same wafer were examined by positron annihilation spectrum analysis after having been, processed by means of thermal Neutron Transmutation Doping (NTD). Compared with the as grown sample with an average positron lifetime of 246 ps at 300 K, the high dose doped one has an average lifetime of 251 ps and the lower dose doped one 248 ps measured under the same condition, indicating that some defects have been introduced in the NTD process. Annealing experimental results show a steady decrease in the average lifetime with increasing annealing temperature up to 550°C. And a peak in lifetime curve around 500°C was observed which may be attributed to defects related structure conversion. Temperature experiments conducted on the low dose doped sample from 150K to 290 K suggest the existence of vacancy-impurity complex which have given rise to an abnormal reduction of average lifetime with increasing temperature. Also a n-type InP sample (A61) was irradiated with thermal neutrons in another reactor and the lifetime results display an increase of 15 ps. Furthermore, to study epithermal neutron irradiation effects on InP, measurements were performed on an n-type InP sample (N119) along with one p-type sample (P118) after having been irradiated with high fluence of epithermal neutrons. The former has an average lifetime of 262 ps and the latter 247 ps after irradiation. The results prove that on some occassion epithermal neutrons can produce sizable defects in InP. Foundation item: Supported by the Science Foundation of Hubei Province (203980532) Biography: WEN Xiang-e (1976-), male, Master candidate, Research direction; majar research interest is defects in semiconductor materials using positron annihilation spectroscopy.     

不同化学配比钨酸铅晶体缺陷的研究

利用正电子湮没寿命谱（PAT）和X光电子能谱（XPS）的测试手段，对不同化学配比钨酸铅晶体中缺陷进行研究，结果表明丰W样品增加晶体中铅空位（VPb）浓度（物质的量比）、而丰Pb样品则少晶体中VPb浓度。这一结论对大尺寸钨酸铅晶体生长过程中关于温度梯度、生长速度和加温制度的有效选取具有一定的参考作用。并结合发射谱的测试，提出钨酸铅晶体中的绿发光很可能产生于由VPb引起的WO3＋O^-。     

Defect properties of GaAs by positron annihilation

Positron lifetime and Doppler Broadening spectra have been measured for three types of GaAs semiconductors. Direct evidence of native vacancy-type defects is found in the semi-insulating (SI-type) and n-type sample as its average lifetime {ie45-1} andS-parameter are larger than the bulk value. No positron trapping occurred in p-type GaAs. The lifetime spectrum of n-GaAs has also been measured as a function of temperature. The increase in average lifetime {ie45-2} from 226 ps to 234 ps at the temperature range 95–330 K was observed and was explained by the ionization of the vacancy. The slight increase in bulk lifetime {ie45-3} with the temperature was caused by the lattice expansion and expansion coefficient α=14×10⁻⁶K⁻¹ was evaluated. Chen Zhiquan: born in May 1969, Ph.D. graduate student. Current research interest is in positron annihilation. Supported by the National Natural Science Foundation of China