ZnCoO和ZnO纳米棒阵列的结构及发光特性

高浓度排列的ZnCoO、ZnO纳米棒在70℃下水热反应垂直生长在含ZnO薄膜涂层的玻璃上,这些阵列的形貌、结构和发光机理分别用场射扫描电子显微镜、X-ray衍射、光致发光来研究,显示出纳米棒直径为150 nm,沿着[0001]方向生长,氨水浓度和ZnO缓冲层在ZnCoO纳米棒成核和生长中起着重要的作用.用波长为325 nm的激光激发样品,测量了光致发光谱,光致发光表明PL光谱是由宽紫外光和可见光构成,并进一步观察发光谱随激发光功率密度的变化关系,对谱线强度、峰值波长进行了测量,同时对发光谱产生的机理、强度饱和值存在的原由、强度随激发光功率密度变化及紫光峰红移的起因进行了分析.     

The ultraviolet and blue luminescence properties of ZnO:Zn thin film

The ultraviolet (UV) and blue luminescence of Zn-rich zinc oxide thin film deposited by electron-beam evaporation have been investigated at room temperature (RT). We observed that the UV and blue electroluminescence (EL) emission band centered around 480 nm which is blue shifted in comparison with that of the ZnO thin film prepared by low pressure metal organic chemical vapor deposition (LP MOCVD). The UV emission is much stronger than blue emission in the photoluminescence (PL) spectra. The field-induced ionization of excited luminescent centers of ZnO:Zn thin film at high electric field and the difference between PL and EL are discussed. The experiments show that the ZnO:Zn thin film provides a hopeful new mechanism to obtain UV and blue emission.     

高分子量聚丙烯酸改性聚乙烯醇膜的耐水性能

将高分子量聚丙烯酸（PAA）与聚乙烯醇（PVA）混合,制备成PAA/PVA混合膜并对其进行热处理。考察了PAA分子量及其含量对混合膜耐水性能的影响,研究了热处理工艺条件对混合膜在沸水环境下的保留率。结果表明,随着PAA分子量和在混合膜中含量的增加,混合膜的耐沸水性能显著提高;当PAA加入量为30%（质量分数）,热处理温度和时间分别为160～180℃、3～5min时,混合膜的综合性能最佳;热处理后混合膜的玻璃化转变温度T_g提高到102℃,有效扩大了膜的使用温度范围。     

氧对纳米ZnO薄膜晶体结构和光致发光的影响

ZnO是一种直接带半导体材料，在光电领域中和GaN一样受到关注．ZnO不仅有与GaN相似的晶体结构，而且它的激子结合能高达60meV，是GaN的2．4倍．采用射频(RF)磁控溅射法在n-Si(001)衬底上生长ZnO薄膜，XRD谱测量显示出氧压对ZnO薄膜的晶体结构有显著影响，用波长为325nm的激光激发，观察到在445nm处有一强的光致发光峰，它来自于氧空位浅施主能级上的电子跃迁到价带，分析了发光峰与氧压的关系以及退火对它的影响。     

Effect of protein molecules on the photoluminescence properties and stability of water-soluble CdSe/ZnS core-shell quantum dots

The fact that the photoluminescence properties of quantum dots are always strongly influenced by the environment limits the scope of further progress in the field of QD’ bio-applications. In this paper, the effects of immunoglobulin G (IgG) on the photo-luminescence properties and stability of water-soluble CdSe/ZnS core-shell quantum dots coated with amphiphilic poly (acrylic acid) (PAA) are studied. Photoluminescence (PL) spectra, UV-vis spectra and excited state lifetime measurements are used to characterize the influence of different protein molecules, such as IgG (goat anti-human IgG, rabbit anti-human IgG, human IgG, and goat anti-human IgG-human IgG conjugates), avidin and bovine serum albumin (BSA) on the PL properties of QDs. The PL intensity and stability of CdSe/ZnS are largely enhanced compared to that of pure CdSe/ZnS QDs when the IgG molecules are added into the QD solution. The PL intensity increases with increasing the IgG concentration, but there appears no influence on the PL peak and a full width at half maximum (FWHM). The PL evolution of QDs as a function of different protein molecules depends on the structure of protein molecules, which is used as a sensor to recognize human IgG. It is inferred that the interaction between PAA coating layer and IgG molecules results in the enhancement of PL intensity. The study of the effect of pH and ion strength on optical properties of QD-IgG mixed solution, compared with the pure QD solution, suggests that pH value and ion strength do not destroy the interaction between the PAA coating layer and IgG. Excited state lifetime analysis indicates that the PL enhancement comes from the passivation of surface of the QDs with the PAA coating layer. IgG molecules have no effects on the properties of the biological system but can increase the stability and PL intensity of CdSe/ZnS QDs, which will enlarge the application of QDs in biomedicine and other fields.     

氧化锌纳米材料的机械法制备及其光学性能研究

采用滚压振动磨在干法室温状态下大批量制备了氧化锌纳米材料,分别利用X射线衍射仪(XRD)、透射电镜(TEM)和原子力显微镜(AFM)对样品晶体结构和形貌进行了表征.结果表明,ZnO纳米颗粒平均粒径约为60 nm,材料结晶良好,无杂质.室温下光致发光(PL)谱显示,在390 nm处有近带边紫外发射峰,这属于激子态发光;同时,在510 nm处有较弱的绿光发射峰,而强度最强的是位于648 nm处的红光发射峰,这两种发射属于表面缺陷态发光.UV-Vis吸收光谱表明,产物在紫外区有很强的紫外吸收,吸收峰出现了蓝移现象,这种蓝移验证了材料存在键断裂等表面缺陷态.Raman光谱表明非极性光学声子模位于437.6com-1处,纵向光学模(LO)峰位于583.6 cm-1处.     

退火温度对ZnO/SiO_2复合薄膜结构及光学性能的影响

采用溶胶-凝胶(sol-gel)法在玻璃衬底上制备ZnO/SiO2(ZSO)复合薄膜,并采用扫描电子显微镜(SEM)、X射线衍射(XRD)、紫外-可见分光光度计(UV-Vis)和光致发光(PL)谱对样品的形貌、晶体结构、透过率及光致发光性能进行表征.SEM结果表明,样品为双层结构,随着退火温度的升高,颗粒变大,并产生团聚现象;XRD结果表明,样品经退火处理后生成六方纤锌矿型ZnO,衍射峰强度和晶粒尺寸随退火温度的升高而增大;UV-Vis结果表明,样品同时具有ZnO和SiO2特征吸收边,双层复合薄膜中ZnO和SiO2两种不同材料的能带不连续导致360nm附近的曲线不平滑,并使能带蓝移,经400℃退火处理后的样品透过率较高;PL谱结果表明,在355nm波长激发下,样品分别在紫外区和蓝光区域产生发射峰,随着退火温度的升高,样品内缺陷密度减小,由缺陷引起的发光强度减弱.     

Al_2O_3微米树的制备及其发光性能研究

以草酸为电解液,采用两次阳极氧化的方法,制备了Al2O3微米树.用X射线衍射仪(XRD)、扫描电子显微镜(SEM)及荧光分光光度计对所制备的Al2O3微米树进行了分析.结果表明,在一定的实验条件下,可以得到形状类似于树状的-αAl2O3,其树干尺寸为600~800 nm,并且由-αAl2O3的颗粒均匀堆积而成.其荧光发射峰在304 nm,与氧空位有关,属于F+型(1B→1A)电子跃迁,并对其发光机制进行了讨论.     

Co掺杂对ZnO纳米棒阵列的结构和性质的影响

通过70℃水热反应制备高密度排列的Zn1-xCoxO(x=0.05,0.10和0.15,统记为ZnCoO)纳米棒阵列,用X射线衍射(XRD)、场发射扫描电子显微镜(FESEM)、X射线光电子能谱(XPS)和光致发光光谱(PL)进行表征.结果表明:Co2+替代Zn2+掺入了ZnO的晶格中,纳米棒沿[0001]方向垂直生长在含ZnO种子层的玻璃上,纳米棒平均直径约为150nm,长4.5μm.ZnO种子层和Co掺杂在ZnCoO纳米棒成核和择优生长中起着重要作用.PL光谱是由宽紫外光带(UV)和可见光(VL)构成.ZnCoO纳米棒阵列UV峰位与纯ZnO的相比发生了蓝移.随着Co含量的增加,UV峰明显宽化并发生红移.文中对紫外峰的宽化和红移起因以及ZnCoO阵列的形成机制进行了讨论.     

Co掺杂ZnO薄膜的结构及光磁性能研究

采用溶胶-凝胶旋涂法在玻璃衬底上制备了Zn1-xCoxO(x=0,0.01,0.03,0.05,0.08,0.12)薄膜.利用显微镜和X射线衍射(XRD)研究了ZnO:Co薄膜的表面形貌和微结构.结果表明,所有ZnO薄膜样品都存在(002)择优取向,尤其是当掺杂浓度为12%时,薄膜c轴择优取向最为显著.振动样品磁强计(VSM)测量表明Zn1-xCoxO薄膜具有室温铁磁性.室温光致发光测量发现,所有样品的PL谱中都出现了较强的蓝光双峰发射和较弱的绿光发射,分析认为这主要是由于Co元素的掺入改变了薄膜的禁带宽度、锌填隙缺陷和氧位错缺陷浓度,其中长波长的蓝光峰和绿光峰都能够通过掺杂进行控制.基于上面的测量结果,探讨了不同波段光发射的机理与掺杂状态之间的关系.     

Effect of Tm-Er concentration ratio on the photoluminescence of Er-Tm: Al2O3 thin films fabricated by pulsed laser deposition

Er-Tm codoped amorphous aluminum oxide (a-Al2O3) thin films have been prepared by an alternative pulsed laser deposition. The phase structure and the surface of the deposited thin films were characterized by the X-ray diffraction (XRD) and scanning electron microscopy (SEM), respectively. Effective photoluminescence (PL) in the region of 350-900nm was observed when pumped at 325nm, and the PL performance has been improved by modifying the Tm3 concentration. With the increasing of [Tm]/[Er] concentration ratio, the intensity of emission of 382nm and 500nm bands was improved effectively while that of 76Snm band increased smoothly. Our results suggest that the resonant energy transfer and cross relaxation between Tm3 and Er3 play an important role in the evolution of the luminescent response.     

用PLD法在MgO(100)衬底上生长ZnO薄膜的结构和光学特性

用脉冲激光沉积法在MgO(100)衬底上沉积了ZnO薄膜.衬底温度分别为400℃、550℃和700℃.利用X射线衍射(XRD)和光致发光谱(PL)对薄膜的结构和光学性能进行研究.X射线衍射的结果表明,在400℃和550℃下生长的ZnO薄膜具有高度c-轴择优取向,但是当衬底温度升高到700℃时,薄膜由单一的择优取向变为有两个较强的择优取向.通过光致发光谱可以发现,在550℃下生长的ZnO薄膜具有强的紫外发射和窄的FWHM,并且紫外发光峰的强度与ZnO薄膜的结晶质量密切相关.     

Zn基ZnO纳米棒阵列的制备和发光特性

N2H4.H2O水热体系中,在Zn基底上制备出了ZnO纳米棒薄膜。采用X射线衍射(XRD)、场发射扫描电镜(FESEM)及发致发光谱(PL)等分析测试手段,研究了ZnO薄膜的形貌结构和发光特性。结果表明,预处理工艺不同,Zn基底表面状态不同,ZnO薄膜形貌也不同。在经预氧化形核的Zn基底上易于制备ZnO纳米棒薄膜。在单一取向的Zn基面上,易于制备ZnO纳米棒阵列。PL测试分析表明,ZnO纳米棒有强的近带边紫外光发射峰和弱的缺陷发射峰。阵列棒本征发射峰强度最高、缺陷峰最弱,反映了该ZnO纳米棒结晶质量高。     

掺杂量对ZnO∶Tb复合薄膜的形貌和光学性能的影响

采用的两步法——先溅射成膜,后退火处理的工艺成功制备了ZnO:Tb复合薄膜,结合XRD、SEM、PL等手段研究了掺杂量对薄膜结构和形貌的影响.发现掺杂量为4.16%时,ZnO:Tb薄膜表面形成新奇T-A-ZnO结构以及不同直径和长度的螺纹状纳米棒;同时出现378 nm和387 nm两个较强的紫外发光峰,以及中心波长位于515 nm的强绿光峰.     

Synthesis and Optical Property Study on ZnO Nanostructures Via Vapor Phase Growth

Nanostructural zinc oxide films have been synthesized via vapor phase growth by heating pure zinc powder. Scanning electron microscopy (SEM) images and X-ray diffraction (XRD) results showed that four kinds of morphologies ZnO nanostructures namely nanowires, well-aligned nanorods, nanofeathers and hexagonal nanorods were formed and all of wurtzite structural crystals. The results indicated that the temperature and substrate play an important role in the formation of different morphologies of ZnO nanostructures. The photoluminescence (PL) measurement was carried out for the wellaligned nanorods ZnO sample and blue emission peaks at 420 and 444 nm have been observed at room temperature. And the blue emission mechanism is discussed.     

聚酰亚胺／二氧化硅纳米杂化材料制备

通过溶胶－凝胶方法（sol-gel）,利用已水解的正硅酸乙酯（TEOS）与芳香族的聚酰胺酸（PAA）溶液混和,制备出了不同二氧化硅含量的杂化薄膜。在实验中,首次采用偶联剂来提高无机组分二氧化硅与有机组分聚酰胺酸的相容性,制备各种二氧化硅含量的有机－无机透明的杂化薄膜。扫描电镜分析结果表明,杂化膜的微观相结构与二氧化硅的含量、偶联剂的加入有关。     

Effect of Tm-Er concentration ratio on the photoluminescence of Er-Tm:Al2O3 thin films fabricated by pulsed laser deposition

Er-Tm codoped amorphous aluminum oxide （a-Al2O3） thin films have been prepared by an alternative pulsed laser deposition. The phase structure and the surface of the deposited thin films were characterized by the X-ray diffraction （XRD） and scanning electron microscopy （SEM）, respectively. Effective photoluminescence （PL） in the region of 350-900 nm was observed when pumped at 325 nm, and the PL performance has been improved by modifying the Tm^3＋ concentration. With the increasing of [Tm]/[Er] concentration ratio, the intensity of emission of 382 nm and 500 nm bands was improved effectively while that of 765 nm band increased smoothly. Our results suggest that the resonant energy transfer and cross relaxation between Tm^3＋ and Er^3＋ play an important role in the evolution of the luminescent response.     

Effect of Tm-Er concentration ratio on the photoluminescence of Er-Tm:Al2O3 thin films fabricated by pulsed laser deposition

Er-Tm codoped amorphous aluminum oxide (a-Al2O3) thin films have been prepared by alternative pulsed laser deposition. The phase structure and surface of the deposited thin films were characterized by the X-ray diffraction (XRD) and scanning electron microscopy (SEM), respectively. Effective photoluminescence (PL) in the region of 350-900 nm was observed when pumped at 325 nm, and the PL performance has been improved by modifying the Tm³⁺ concentration. With the increasing of [Tm]/[Er] concentration ratio, the intensity of emission of 382 nm and 500 nm bands was improved effectively while that of 765 nm band increased smoothly. Our results suggest that the resonant energy transfer and cross relaxation between Tm³⁺ and Er³⁺ play an important role in the evolution of the luminescent response.     

溅射法制备的ZnO薄膜的光发射

报道了用射频磁控溅射法在硅衬底上制备出具有好的(002)择优取向的多晶ZnO薄膜，在514nm处观察到显著的单色绿光发射峰；且随着氧分压的增加，绿光发射峰的强度减弱．经真空中退火该发射峰增强；而在氧气中退火该发射峰强度减弱．该发射峰强度依赖于氧分压的事实表明：514nm绿光发射峰与ZnO薄膜中的氧空位缺密切相关，认为它来自于氧空位缺陷深施主能级上的电子到价带顶上的跃迁．     

反应气压对氢化非晶氮化硅薄膜的发光特性影响

采用螺旋波等离子体增强化学气相沉积(HWP-CVD)技术制备了氢化非晶氮化硅(a-SiNx:H)薄膜,利用光致发光谱(PL)和傅里叶红外吸收谱(FTIR)研究了不同气压条件下所形成薄膜的发光特性.结果表明,在较高气压条件下,所沉积薄膜的发光峰位在2.5 eV附近;减小气压使薄膜的沉积速率下降,其内部原子微观结构发生变化,薄膜的发光峰位在3.05 eV处,其半高宽为1.48 eV.