| 动态椭偏光谱技术及其在薄膜测量中应用的研究 |
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| 引用本文： | 王佩红,王磊,蔡琪,孙兆奇. 动态椭偏光谱技术及其在薄膜测量中应用的研究[J]. 合肥工业大学学报(自然科学版), 2005, 28(8): 947-951 |
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| 作者姓名： | 王佩红 王磊 蔡琪 孙兆奇 |
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| 作者单位： | 安徽大学,安徽省信息材料与器件重点实验室,安徽,合肥,230039;安徽大学,安徽省信息材料与器件重点实验室,安徽,合肥,230039;安徽大学,安徽省信息材料与器件重点实验室,安徽,合肥,230039;安徽大学,安徽省信息材料与器件重点实验室,安徽,合肥,230039 |
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| 基金项目： | 国家自然科学基金资助项目(59972001)，安徽省自然科学基金资助项目(01044901)，安徽省信息材料与器件重点实验室开放课题资助项目 |
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| 摘 要： | 文章介绍了动态反射式椭圆偏振光谱技术的原理,采用椭圆偏振光谱技术测量得到P型Si(111)晶片,利用直流溅射制备的不同厚度Cu膜样品的椭偏光谱;利用特定的解谱程序并结合实验参数,对椭偏光谱进行解谱得到了样品的光学常数谱及其厚度;对于P型Si(111)晶片的光学常数谱,通过与Palik数据比较可以发现两者极为相似,只是在数值上存在差异;对于不同厚度的Cu膜样品,从晶粒尺寸、致密度和缺陷等方面分析了光学常数随厚度变化的原因;通过分析比较得知,经过拟合计算得到的P型Si(111)晶片和Cu膜样品的光学常数具有很高的准确性。
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| 关 键 词： | 动态椭偏术 光学常数 P型硅 Cu膜 |
| 文章编号： | 1003-5060(2005)08-0947-06 |
| 修稿时间： | 2004-12-03 |
Research on dynamic reflecting spectroscopic ellipsometry and its application in the measurement of thin films |
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| WANG Pei-hong,WANG Lei,Cai Qi,SUN Zhao-qi. Research on dynamic reflecting spectroscopic ellipsometry and its application in the measurement of thin films[J]. Journal of Hefei University of Technology(Natural Science), 2005, 28(8): 947-951 |
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| Authors: | WANG Pei-hong WANG Lei Cai Qi SUN Zhao-qi |
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| Abstract: | Spectroscopic ellipsometry is widely used in studying thin films and surface physics for its unique advantages. In this paper,the principles of dynamic reflecting spectroscopic ellipsometry are introduced firstly. Then the optical constants of p-type Si(111) and Cu thin films prepared by DC sputtering deposition are obtained using the automatic variable angle spectroscopic ellipsometer. It is found that the optical constants of Si from the experiment and the Palik's data are very similar except some difference in the numerical value. Explanations are given for the optical constant's changes between Cu films with different thickness. Through analysis and comparison,it is known that the calculated optical constants of samples have very high precision. |
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| Keywords: | dynamic spectroscopic ellipsometry optical constant p-type Si Cu film |
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