MEVVA离子源等离子体密度测量

采用静电探针方法测量了ＭＥＶＶＡ离子源中的等离子体，得到了单探针，双探针的特性曲线，等离子体电子温度和等离子体离子密度以及离子密度随离子源轴向的变化和径向分布。其中离子密度随离子源径向的分布近似为高斯分布，还研究了等离子体密度与弧流的关系，并采用加会切磁场的方法试图改善等离子体密度的径向分布的均匀性，得到了一些有益的结果。

THE PLASMA DENSITY MEASUREMENT FOR MEVVA ION SOURCE

The plasma in a MEVVA ion source was measured by using electrical probe method. The characteristics of single and double probe, the plasma electron temperature and ion density as well as the axial change and the radial distribution of the plasma density are obtained. The radial distribution is founded to be Gaussian distribution.The relationship between plasma density and arc current is studied. Cusped magnetic field was used to improve the homogeneity of the radial distribution of the plasma density in front of the first extractor. The effect of introducing cusped magnetic field is given here.