| CsCl添加剂对激光诱导土壤等离子体辐射强度的影响 |
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| 引用本文： | 陈金忠,张琳晶,孙江,王春生,魏艳红,李旭.CsCl添加剂对激光诱导土壤等离子体辐射强度的影响[J].科学通报,2011(Z1). |
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| 作者姓名： | 陈金忠 张琳晶 孙江 王春生 魏艳红 李旭 |
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| 作者单位： | 河北省光电信息材料重点实验室河北大学物理科学与技术学院; |
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| 基金项目： | 国家自然科学基金(10804025); 河北省自然科学基金(A2006000951)资助项目 |
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| 摘 要： | 为了提高激光诱导击穿光谱技术对低含量物质成分的检测能力,实验研究了CsCl添加剂对土壤样品发射光谱的增强效应.利用高能量钕玻璃脉冲激光烧蚀样品,由组合式多功能光栅光谱仪和CCD光谱采集处理系统记录等离子体光谱,并通过测量光谱线的强度和Stark展宽分别计算了等离子体的电子温度和电子密度.实验结果证明,随着CsCl加入量的增加,激光诱导等离子体的光谱强度、信背比、电子温度和电子密度均呈现出先增大而后减小的变化规律.当CsCl加入量为15%时,等离子体辐射最强,元素Mn,K,Fe和Ti的谱线强度分别比无添加剂时提高了383%,348%,303%和267%,信背比分别提高了204%,149%,150%和142%;而等离子体的温度和电子密度比无添加剂时分别提高了10%和13%.
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| 关 键 词： | 激光诱导等离子体 氯化铯添加剂 光谱强度 |
Effect of CsCl additive on laser-induced soil plasma radiation |
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| CHEN JinZhong,ZHANG LinJing,SUN Jiang,WANG ChunSheng,WEI YanHong & LI Xu Hebei Provincial Key Laboratory of Photo-Electricity Information Materials,College of Physics Science , Technology,Hebei University,Baoding ,China.Effect of CsCl additive on laser-induced soil plasma radiation[J].Chinese Science Bulletin,2011(Z1). |
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| Authors: | CHEN JinZhong ZHANG LinJing SUN Jiang WANG ChunSheng WEI YanHong & LI Xu Hebei Provincial Key Laboratory of Photo-Electricity Information Materials College of Physics Science Technology Hebei University Baoding China |
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| Institution: | CHEN JinZhong,ZHANG LinJing,SUN Jiang,WANG ChunSheng,WEI YanHong & LI Xu Hebei Provincial Key Laboratory of Photo-Electricity Information Materials,College of Physics Science and Technology,Hebei University,Baoding 071002,China |
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| Abstract: | In order to improve the laser-induced breakdown spectroscopy for low-level elements testing capability,the enhancement effect of CsCl additive on the emission spectra of soil samples was studied.The laser spectrum analytical system is composed of a high-energy neodymium glass laser used for abating samples,a multifunctional and automatic grating spectrometer,and a CCD data acquisition system used for recording plasma spectra.The electron temperature and electron density of plasmas were calculated by measuri... |
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| Keywords: | laser-induced plasma CsCl additive spectrum intensity |
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