| 磁控弧光增强等离子体CVD(化学气相沉积)法制备立方氮化硼薄膜 |
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| 引用本文： | 赵春红,牛孔贞.磁控弧光增强等离子体CVD(化学气相沉积)法制备立方氮化硼薄膜[J].南开大学学报,2007,40(3):15-20. |
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| 作者姓名： | 赵春红 牛孔贞 |
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| 作者单位： | 南开大学物理科学学院,天津300071 |
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| 基金项目： | Acknowledgement： The author thanks professor Y. N. Zhao of National Laboratory of Superhard Materials for valuable discussions. Thanks are also duo to professor Liu for XRD measurement. |
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| 摘 要： | 采用一种新的自行设计的磁控弧光增强等离子体化学气相沉积法制备立方氮化硼(c-BN)薄膜.现已成功地在单晶硅上制备出了含量较高的立方氮化硼(c-BN)薄膜.制备出的薄膜用傅立叶红外(FTIR)光谱和X射线衍射(XRD)谱来表征.同时研究了各个沉积参数(基底直流负偏压、弧光等离子体放电电流、气体流量比)对立方氮化硼薄膜制备的影响.
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| 关 键 词： | 立方氮化硼薄膜 弧光等离子体 X射线衍射 傅立叶红外光谱 c-BN films Arc plasma X-ray diffraction(XRD) Fourier transform infrared (FTIR) 磁控 弧光 增强 等离子体 化学 气相沉积 法制 氮化 硼薄膜 Chemical Vapor Deposition Plasma Magnetron Thin Films content thin film variation deposition parameters discharge flow ratio |
| 文章编号： | 0465-7942（2007）02-0015-06 |
| 修稿时间： | 2006-12-02 |
Deposition of c-BN Thin Films by Magnetron Arc Enhanced Plasma Chemical Vapor Deposition |
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| Zhao Chunhong,Niu Kongzhen.Deposition of c-BN Thin Films by Magnetron Arc Enhanced Plasma Chemical Vapor Deposition[J].Acta Scientiarum Naturalium University Nankaiensis,2007,40(3):15-20. |
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| Authors: | Zhao Chunhong Niu Kongzhen |
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| Institution: | College of Physics Science, Nankai University, Tianjin 300071, China |
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| Abstract: | |
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| Keywords: | c-BN films Arc plasma X-ray diffraction(XRD) Fourier transform infrared (FTIR) |
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