| 直流磁控溅射法制备TiO2薄膜的研究 |
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| 引用本文： | 刘子丽,肖峻,蒋向东,孙继伟.直流磁控溅射法制备TiO2薄膜的研究[J].西南民族学院学报(自然科学版),2009,35(6):1259-1262. |
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| 作者姓名： | 刘子丽 肖峻 蒋向东 孙继伟 |
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| 作者单位： | [1]西南民族大学电气信息工程学院,成都610041 [2]电子科技大学光电信息学院,成都610054 |
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| 摘 要： | 论术采用直流磁控溅射法制备TiO2薄膜的实验研究。研究了氧流量、基片温度对制备TiO2薄膜的影响，并测量了薄膜的晶相结构和表面形貌，结果表明制备出了具有锐钛矿晶体结构的TiO2薄膜．
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| 关 键 词： | TiO2薄膜 直流磁控溅射 氧流量 基片温度 |
Research of TiO2 thin films prepared by DC magnetron sputtering |
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| Institution: | LIU Zi-li, XIAO Jun, JIANG Xiang-dong, SUN Ji-wei (1.School of Electrical ＆ Information Engineering, Southwest University for Nationalities, Chengdu 610041, P.R.C.; 2. School of Opto-electronic Information, University of Electronic Science and Technology, Chengdu, 610054, ER.C) |
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| Abstract: | TiO2 Thin Films are prepared by DC magnetron sputtering. The influences of O2 flow, substrate temperature on the structrural properties of the films are studied. In this paper, the morphological characteristic of TiO2 Thin Films is also discussed. In these films anatase are observed. |
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| Keywords: | TiO2 Thin Films DC magnetron sputtering O2 flow substrate temperature |
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