| CNx薄膜的制备和表征 |
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| 引用本文： | 程德刚 吕反修. CNx薄膜的制备和表征[J]. 北京科技大学学报, 1997, 19(1): 100-104 |
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| 作者姓名： | 程德刚 吕反修 |
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| 作者单位： | 北京科技大学材料系!北京，100083，北京科技大学材料系!北京，100083，北京科技大学材料系!北京，100083，北京科技大学材料系!北京，100083，北京科技大学材料系!北京，100083 |
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| 摘 要： | 采用在纯氮气氛中磁控制溅射高纯石墨靶的方法成功地制备了碳氮薄膜，研究表明，碳氮膜的硬度不仅与薄膜中的氮含量有关，更重要的是与碳氮原子之间的结合状态有关，Ｃ＝Ｎ健有利于薄膜硬度的提高，高溅射功能和高偏压能促进碳氮参键的形成，从而提高薄膜硬度。
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| 关 键 词： | 磁控溅射 碳氮薄膜 硬度 制备 表面形貌 |
Preparation and Characterization of Magnetron Sputtered CN_x Films |
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| Cheng Degang, Lu Fanxiu ,Yang Lianyin ,Song Bo, Tong Yumei. Preparation and Characterization of Magnetron Sputtered CN_x Films[J]. Journal of University of Science and Technology Beijing, 1997, 19(1): 100-104 |
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| Authors: | Cheng Degang Lu Fanxiu Yang Lianyin Song Bo Tong Yumei |
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| Abstract: | CNx films have been prepared by DC magnetron sputtering of graphite inpure nitrogen atmosphere. N/C ratio is between 0.21 and 0.42, strongly correlating withdeposition parameters. The hardness and modulus are related not only to the N/C ratio,but also to the formation and the amount of C = N triple bonds in the CNx films. Highbias voltage and high sputtering power are beneficial to the increase of C = N bands andso are helpful to increase the hardness and bulk modulus. |
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| Keywords: | magnetron sputtering carbon nitride film hardness |
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