DyFeCo磁光薄膜的溅射工艺研究

采用射频磁控溅射方法制备了ＤｙＦｅＣｏ非晶磁光薄膜，研究了氩气压、溅射功率对ＤｙＦｅＣｏ薄膜性能的影响．实验表明：反射率随氩气压升高而降低，矫顽力随氩气压升高而逐渐增大，达到一定值时克尔回线反向，随后矫顽力又逐渐减小，高气压下的矫顽力温度特性较低气压下的矫顽力温度特性要好，但氩气压进一步升高，磁光克尔回线矩形度变差．本征磁光克尔角随氩气压升高而增大，到达最大值后又逐渐减小．反射率随溅射功率增加而升高，到达最大值后又逐渐下降．矫顽力随溅射功率增加而逐渐增大，到达最大值后，磁光克尔回线反向，然后矫顽力又逐渐减小

On the Sputtering Technology for DyFeCo Magneto Optic Films

DyFeCo amorphous films have been prepared onto a glass substrate with r.f. magnetron sputtering. The influence of the argon pressure and sputtering power on the properties of the films are discussed. Test results show that the reflectivity and the Kerr hysteresis loop squareness are decreased with an increase in the pressure. The coercive force is increased with the pressure up to a certain value when the Kerr hysteresis loops are reversed. Then, the coercive force is decreased. The Kerr angle is increased with the pressure, but is decreased after a maximum is reached. The reflectivity and Kerr angle are also increased with the sputtering power and decreased after a maximum is reached. The coercive force is increased with the sputtering power and after a maximum is reached, the Kerr hysteresis loops are reversed and the coercive force is decreased.