| 离子轰击碳膜凸起形成碳纳米尖端的理论分析 |
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| 引用本文： | 王必本,徐幸梓,张兵.离子轰击碳膜凸起形成碳纳米尖端的理论分析[J].河南师范大学学报(自然科学版),2006,34(4):203-208. |
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| 作者姓名： | 王必本 徐幸梓 张兵 |
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| 作者单位： | 1. 北京工业大学,应用数理学院,北京,100022
2. 重庆大学,材料科学与工程学院,重庆,400044 |
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| 基金项目： | 教育部留学回国人员科研启动基金 |
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| 摘 要： | 用CH4、NH3和H2为反应气体,利用等离子体增强热丝化学气相沉积系统在沉积有碳膜的Si上制备了碳纳米尖端.用原子力显微镜表征了碳膜,结果表明碳膜是凸凹不平的膜,有许多凸起.在生长碳纳米尖端的过程中,由于既有含碳离子在凸起上的沉积,又有氢离子和含氮离子对凸起的刻蚀,根据有关离子沉积和溅射刻蚀的理论,理论分析了离子轰击碳膜凸起碳纳米尖端的形成.
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| 关 键 词： | 碳纳米尖端 离子轰击 化学气相沉积 |
| 文章编号： | 1000-2367(2006)04-0203-06 |
| 收稿时间： | 2006-08-16 |
| 修稿时间： | 2006年8月16日 |
Theoretical Analysis of Formation of Carbon Nanotips from Carbon Film Spikes by Ion Bombardment |
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| WANG Bi-ben,XU Xing-zi,ZHANG Bing.Theoretical Analysis of Formation of Carbon Nanotips from Carbon Film Spikes by Ion Bombardment[J].Journal of Henan Normal University(Natural Science),2006,34(4):203-208. |
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| Authors: | WANG Bi-ben XU Xing-zi ZHANG Bing |
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| Institution: | 1. College of Applied Mathematics and Physics, Beijing University of Technology, Beijing 100022,China; 2. College of Materials Science and Engineering, Chongqing University, Chongqing 400044,China |
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| Abstract: | Carbon nanotips were prepared from a carbon film deposited on silicon by plasma-enhanced hot filament chemical vapor deposition using CH_4,NH_3 and H_2 as the reaction gases.The carbon film was characterized by atomic force microscopy and the result indicates that the carbon film is a rough film with a number of spikes.Because there were carbonaceous ions to deposit on the spikes as well as hydrogen and nitrogenous ions to etch them during growing the carbon nanotips,their formation from the carbon film spikes by ion bombardment was theoretically analyzed according to theory related to ion depositon and sputter-etching. |
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| Keywords: | carbon nanotips ion bombardment chemical vapor deposition |
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