等离子掺杂聚乙烯薄膜介电、光学和光电特性研究

本文研究了等离子聚合和等离子掺杂聚乙烯薄膜的介电、光学特性和光电效应.结果表明,等离子聚合薄膜在组成结构和性能上不同于化学聚合薄膜.氮进入聚乙烯薄膜使击穿强度提高、电频及光频区介电常数增大,暗电导率与光电导率都有明显降低.硅进入聚乙烯薄膜却使击穿强度下降、暗电导率减小、光电导率提高约两个数量级.研究认为:氮、硅掺杂的不同影响是由于引入了不同的电子陷阱能级所造成的.文中还报导了掺硅聚乙烯薄膜的异常光伏效应现象.

STUDY OF THE DIELECTRIC,OPTICAL AND PHOTOELECTRIC PROPERTIES OF DOPPED POLYETHYLENE FILMS FABRICATED BY PLASMA TECHNIQUE

The dielectric,optical properties and photoelectric effects of nitrogen-and silicon-incorporated polyethylene films,fabricated by plasma polymerization and implantation,have been measured under various conditions.The plasma-polymerized films have distinct properties from the ones based on(?)conventional chemical polymerization.The incorporation of nitrogen into polyethylene film results in an inorease in breakdown strength,dielectric constant and dissipation factor at frequencies below the optical frequ(?)noy range and in a decrease in dark conduc- tivity,photoconductivity and extinction coefficient in the optical frequency range.However,the incorporation of silioon causes a decrease in breakdown strength and an increase in photoconductivity.The opposite effects of the in- corporation of nitrogen to silicon in polythylene are attributed to the different trap levels introduced by incorporated nitrogen and silicon.In the present paper,some anomalous photovoltaic effects in polyethylene films with and without silicon incorporation are also rsported.The potential applications in many areas of high technique of the polymer films fabricated by plasma tech- nique are discussed.