化学镀CoB薄膜动力学参数的回归分析

根据化学镀CoB薄膜试验得到镀液中反应物浓度、pH值、温度以及对应沉积速率．利用回归分析法，建立一元线性回归处理的数学模型和多元线性回归处理的数学模型．实验数据的拟合程度用相关系数R与剩余方差S来表征，借助于计算机编程运算，求出回归系数的估计值b0-3、估计值的置信区间、残差r、残差的置信区间rint分别确定上述诸因素所对应的反应动力学参数，并求出镀液中反应物浓度、pH值、温度与对应沉积速率的对数关系曲线表达式，导得了镀液沉积速率的方程式．优化了实验方案，确定了镀液的构成和工艺条件，成功制备了性能良好的合金镀层．

The linear regression methods for solving the kinetic parameters of electro less CoB thin film

The pH value, operation temperature and deposition rate were given for CoB thin film through the experiments in the plating solution. With regression analysis, a mathematics model of both simple linear and multiple linear regressions were established. The fitting extent of the experiments data was described by correlation coefficient R, residual variance S. the estimator of regression coefficient b_(0-3), its confidence interval , the residual error r and the confidence interval for residual errors r_(int) were ascertained by the computer program. Logarithmic relationship curves between the deposition rate and concentration of reactants. pH value, operation temperature were given for alkaline electro less CoB films plating solution through the experiments. The reaction kinetic parameters were obtained form the comparison of the experimental results, and the kinetic equations and experimental equation of deposition rate were found out and the experimental equation of deposition rate was derived. All kinds of complexion agent and linear regression analysis were adopted to optimize the experimental project. The optimal composition of the plating solution and operating conditions were obtained, to produce Co-B alloy thin film with good quality.Liu Changhui Doctoral Candidate; Dept. of Electronic Sci. & Tech., Huazhong Univ. of Sci. & Tech., Wuhan 430074, China.