| Fe(NO_3)_3浓度对水热法腐蚀多孔硅的影响 |
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| 引用本文： | 赵韦人,陈景东,丁娟,陈绍军.Fe(NO_3)_3浓度对水热法腐蚀多孔硅的影响[J].汕头大学学报(自然科学版),2006,21(2):43-48. |
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| 作者姓名： | 赵韦人 陈景东 丁娟 陈绍军 |
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| 作者单位： | 汕头大学物理系,广东,汕头,515063 |
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| 摘 要： | 用水热腐蚀法,通过改变腐蚀液中Fe(NO3)3的浓度,制备多孔硅样品.用扫描电子显微镜、荧光分光光度计和傅立叶红外光谱仪对样品微结构和光学特性进行检测,并结合Islam-Kumar模型对检测结果进行分析.结果表明,增大腐蚀液中Fe(NO3)3浓度,可加快腐蚀速度,并使多孔硅中纳米硅尺寸减小,比表面积增大,从而引起样品发射峰发生蓝移,且对应于Si‖O键的红外吸收增强.
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| 关 键 词： | 多孔硅 纳米硅 水热腐蚀法 光致发光 Si=O键 |
| 文章编号： | 1001-4217（2006）02-0043-06 |
| 收稿时间： | 2006-02-16 |
| 修稿时间： | 2006年2月16日 |
The Effect of the Fe(NO3)3 Concentration in Producing Porous Silicon by Hydrothermal Etching |
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| ZHAO Wei-ren,CHEN Jing-dong,DING Juan,CHEN Shao-jun.The Effect of the Fe(NO3)3 Concentration in Producing Porous Silicon by Hydrothermal Etching[J].Journal of Shantou University(Natural Science Edition),2006,21(2):43-48. |
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| Authors: | ZHAO Wei-ren CHEN Jing-dong DING Juan CHEN Shao-jun |
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| Institution: | Department of Physics, Shantou University, Shantou 515063, Guangdong, China |
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| Abstract: | Three porous silicon(PS) are prepared by Hydrothermal Etching with different Fe(NO3)3 solution concentration.All the samples are studied with Scanning Electron Microscope,Fluorescence Spectrophotometer,and Fourier Transform Infrared Spectrometer.Moreover,the PLs are analyzed with the mode of Islam and Kumar.Both the experiment results and simulation meet very well.And it is also shown that higher the concentration of Fe(NO3)3 solution will result in a higher erode rate,smaller nano silicon particle dimension,higher PL peak energy,and stronger Si= O bond infrared absorption. |
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| Keywords: | porous silicon nano silicon particles hydrothermal etching photoluminescence Si=O bond |
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