高环境稳定性多孔氧化硅减反膜的制备及表征

 以正硅酸乙酯为硅源, 氨水为催化剂, 采用溶胶凝胶法, 经过提拉过程制备了多孔氧化硅光学减反膜, 通过后嫁接十七氟癸基三乙氧基硅烷(FAS-17)和六甲基二硅氮烷(HMDS)提高薄膜的环境稳定性。采用紫外可见光谱仪、红外光谱仪、原子力显微镜和接触角仪等测试技术及抗污染实验分析了薄膜的性能。结果表明, 改性后的薄膜光学透射率高达99.82%, 表面粗糙度为3.9 nm, 薄膜与水接触角达125°, 在10^-3 Pa 真空环境下污染2 个月后透射率仅降低0.03%, 说明薄膜具有很高的环境稳定性。

Preparation and characterization of porous silica antireflective coating of high environment stability

The porous silica optical antireflective coating is prepared by the sol-gel method with the tetraethoxylsilane as the precursor and the ammonia as the catalyst via a dip-coating process. The environment stability of the antireflective coating could be greatly improved by post-grafting 1H, 1H, 2H, 2H-perfluorodecyltriethoxysilane (FAS-17) and hexamethyldisilazane (HMDS). The properties of the coating are characterized by the UV-VIS spectrometer, the FTIR spectrophotometer, the atomic-force microscopy, the contact angle measurement and the anti-pollution test. The results indicate that for the modified coating, the peak transmittance is up to 99.82%, the surface roughness is only 3.9 nm, and, the contact angle with water is 125°. Especially, the decrease of the transmittance when being tested with water and polydimethylsiloxane pollution in vacuum for two months is as small as 0.03%, suggesting that the coating has an excellent environment stability.