| 一种用于光刻模拟的新光源模型 |
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| 引用本文： | 李智峰,史峥,陈晔.一种用于光刻模拟的新光源模型[J].江南大学学报(自然科学版),2007,6(5):528-531. |
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| 作者姓名： | 李智峰 史峥 陈晔 |
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| 作者单位： | 浙江大学,超大规模集成电路研究所,浙江,杭州,310027 |
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| 基金项目： | 国家自然科学基金项目(60176015) |
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| 摘 要： | 讨论提出用连续的光源描述函数代替0~1分布的光源函数精确描述光源光强分布,以提高光刻分辨率.在SPLAT的基础上应用新的光源特征函数,建立新的光源模型,并结合测试模板进行仿真.结果显示,新的模型在精度上有较为明显的改善,新光源特征函数有助于建立更为精确的光刻模型.
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| 关 键 词： | 光刻仿真 光源 光学临近校正 |
| 文章编号： | 1671-7147（2007）05-0528-04 |
| 收稿时间： | 2006-02-25 |
| 修稿时间： | 2006-05-20 |
A New Illumination Source Model for Lithography Simulation |
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| LI Zhi-feng,SHI Zheng,CHEN Ye.A New Illumination Source Model for Lithography Simulation[J].Journal of Southern Yangtze University:Natural Science Edition,2007,6(5):528-531. |
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| Authors: | LI Zhi-feng SHI Zheng CHEN Ye |
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| Institution: | Institute of VLS1 Design, Zhejiang University, Hangzhou 310027, China |
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| Abstract: | A new method for more accurate representation of the illumination source during OPC simulation and modeling was presented.The method involves using smooth functional representation of the illumination source instead of 0~1 function.The new source function was used to build a new lithography model based on SPLAT.The test patterns were examined and it was shown that the new model is more accurate.Therefore,the smooth representation of the illumination source provides higher accuracy in lithography simulation. |
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| Keywords: | optical lithography illumination source optical proximity correction |
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