铝阳极氧化膜二次阳极电解沉积MoS2

Electrodepositied MoS2 in the Pores of Anodic Films on Aluminium

The factors affecting the voltage-time transients of anodic electro-deposition of porous anodic films on aluminium in (NH4)2MoS4 solution at various constant current densities have been studied. EPMA analyses reveal that the deposited solid lubricant distributes in the whole pore profile and has higher content in the region near the outer surface of the film. It is suggested that the DC anodic deposition process is a reanodizing process. The thickness of barrier layer increases with the rise of the voltage during reanodizing. The ratio between the thickness of barrier layer and the applied voltage is in the range of 1.0~1.4nm/V. No initiation of larger pores and cells corresponding to the higher voltage was found in the newly developed barrier layer. The films with MoS2 deposition have lower friction coefficent and higher wear resistance, but its hardness is lowered.