| 用光反射测试方法检测的硅抛光片和外延片表面的图谱 |
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| 引用本文： | 颜彩繁,王宏杰.用光反射测试方法检测的硅抛光片和外延片表面的图谱[J].南开大学学报,1998,31(3):92-94. |
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| 作者姓名： | 颜彩繁 王宏杰 |
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| 作者单位： | 南开大学物理系!天津300071(颜彩繁，李增发，李训普，张光寅)，天津半导体材料厂!天津300161(王宏杰，张福祯) |
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| 摘 要： | 利用检测半导体硅抛光片及硅外延片表面缺陷的光反射法（魔镜法）［1］，观测到了二十余种硅抛光片及硅外延片表面缺陷的图样．本文报道了部份图样．
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| 关 键 词： | 硅片 缺陷 表面质量 光反射方法 |
THE SURFACE QUALITY PATTERNS OF POLISHED SILICON WAFERS AND EPITAXIAL WAFERS MEASURED BY LIGHT REFLECTION METHOD |
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| Yan Caifan, Li Zengfa, Li Xunpu, Zhang Guangyin.THE SURFACE QUALITY PATTERNS OF POLISHED SILICON WAFERS AND EPITAXIAL WAFERS MEASURED BY LIGHT REFLECTION METHOD[J].Acta Scientiarum Naturalium University Nankaiensis,1998,31(3):92-94. |
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| Authors: | Yan Caifan Li Zengfa Li Xunpu Zhang Guangyin |
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| Abstract: | Measurement results of the surface quality patterns of polished silicon wafers and epitaxial wafers by light reflection method are reported. About 20 kinds of typical patterns of silicon wafers surface defect are observed and some of them are reported. |
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| Keywords: | silicon wafers surface quality light reflection method |
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