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溅射过程的Monte Carlo方法模拟计算
引用本文:单慧波 姜恩永. 溅射过程的Monte Carlo方法模拟计算[J]. 天津大学学报(自然科学与工程技术版), 1989, 0(2): 107-112
作者姓名:单慧波 姜恩永
作者单位:天津大学物理系(单慧波,姜恩永),天津大学物理系(李金锷)
摘    要:运用Monte Carlo方法对溅射过程进行了模拟计算,其结果清楚地描述了溅射的微观过程,溅射产额的计算值与实验值吻合。

关 键 词:溅射过程 Monte Carlo 模拟计算

COMPUTER SIMULATION OF SPUTTER PROCESS BY MONTE CARLO METHOD
Shan Huibo Jiang Enyong Li Jin''e. COMPUTER SIMULATION OF SPUTTER PROCESS BY MONTE CARLO METHOD[J]. Journal of Tianjin University(Science and Technology), 1989, 0(2): 107-112
Authors:Shan Huibo Jiang Enyong Li Jin''e
Affiliation:Department of Physics
Abstract:This paper describes the computer simulation of sputter process on the binary collision model by the Monte Carlo method. The results show clearly the microscopic process of sputtering, and the calculation results of sputtering yield are in good agreement with those experiments.
Keywords:sim ulation   Monte Carlo   sputter process
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