| 面曝光快速成形系统的光学成像系统设计 |
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| 引用本文： | 杨剑,胥光申,罗声,金京. 面曝光快速成形系统的光学成像系统设计[J]. 西安工程科技学院学报, 2011, 25(1) |
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| 作者姓名： | 杨剑 胥光申 罗声 金京 |
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| 作者单位： | 西安工程大学机电工程学院; |
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| 基金项目： | 国家自然科学基金资助项目(50745017;50875194) |
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| 摘 要： | 为了得到曝光量均匀的工作面,满足面曝光快速成形技术的需要,提出1种对投影仪成像光路的改造方法.选择反远距光路,2次成像的光学成像系统设计方案,使用非定制镜片,设计用于面曝光快速成形系统的光学成像系统,该系统由2个组元和1个光阑构成.使用ZEMAX软件对像差进行分析,系统最大慧差值为0.08mm,最大像面畸变为1.1%,像面中心分辨率达0.05mm.该成像光学系统的设计,为低成本面曝光快速成形系统的构建提供了基础.
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| 关 键 词： | 快速成形 整层曝光 光学设计 像差分析 |
The design of imaging optical system in mask projection stereolithography system |
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| YANG Pian,XU Guang-shen,LUO Sheng,JIN Jing. The design of imaging optical system in mask projection stereolithography system[J]. Journal of Xi an University of Engineering Science and Technology, 2011, 25(1) |
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| Authors: | YANG Pian XU Guang-shen LUO Sheng JIN Jing |
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| Abstract: | In order to obtain uniform exposure work plane,to meet the mask projection stereolithography system requirements for optical imaging system,a transformation method of the projector optical path is presented,by adopting the design of twice imaging and using anti-distance optical structure.Then on this basis,non-custom lenses are used to design the imaging optical system used in mask projection stereolithography system,which consists of two components and one stop.After the design,ZEMAX software was used to a... |
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| Keywords: | rapid prototyping mask projection stereolithography optical design aberration analysis |
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