首页 | 本学科首页   官方微博 | 高级检索  
     检索      

利用FT-IR和XPS研究纳米和微米氮化硅粉体在不同气氛下的表面结构变化(英文)
引用本文:夏茹,郝家宝,张立成,钱家盛,袁孝友,李彬.利用FT-IR和XPS研究纳米和微米氮化硅粉体在不同气氛下的表面结构变化(英文)[J].安徽大学学报(自然科学版),2013(2):81-87.
作者姓名:夏茹  郝家宝  张立成  钱家盛  袁孝友  李彬
作者单位:安徽大学化学化工学院;安徽大学安徽省绿色高分子材料重点实验室
基金项目:Supported by the University Natural Science Research Project of Anhui Province of China(KJ2011Z015);211 Project of Anhui University,Project of Key Laboratory of Environment-friendly Polymer Materials of Anhui Provincial(KF2011010);Research Fund for the Doctoral Program of Higher Education of China(20113401110003);Business Incubators Project of Science and Technology Enterprise for Anhui Province(10100206015-02);General Administration of Quality Supervision,Inspection and Quarantine(2010IK079)
摘    要:采用红外光谱技术和光电子表面能谱技术比较纳米和微米氮化硅粉体表面结构在空气中和在氮气中的变化规律.研究结果显示,纳米氮化硅在空气中逐渐吸附氧气和有机物质,其表面形成了Si—OH、C—C、C—N等化学基团,而在惰性的氮气气氛中,纳米氮化硅的表面氧化被有效抑制.上述研究工作为纳米氮化硅的表面改性研究提供了一定的理论支持.

关 键 词:氮化硅  表面结构  FT-IR  XPS

Study on the surface structure of nano-and micro-silicon nitride in different atmospheres by FT-IR and XPS
XIA Ru,HAO Jia-bao,ZHANG Li-cheng,QIAN Jia-sheng,YUAN Xiao-you,LI Bin.Study on the surface structure of nano-and micro-silicon nitride in different atmospheres by FT-IR and XPS[J].Journal of Anhui University(Natural Sciences),2013(2):81-87.
Authors:XIA Ru  HAO Jia-bao  ZHANG Li-cheng  QIAN Jia-sheng  YUAN Xiao-you  LI Bin
Institution:1(1.College of Chemistry and Chemical Engineering,Anhui University,Hefei 230039,China;2.Key Laboratory of Environment-friendly Polymer Materials of Anhui Province,Anhui University,Hefei 230039,China)
Abstract:In this paper,surface structure's change regularity of nano-and micro-silicon nitride powder in air and nitrogen atmospheres was studied by FT-IR and XPS.The results showed that nano-silicon nitride in air gradually absorbed oxygen and organic matter,and Si—OH,C—C,C—N groups were produced on the surface of nano-silicon nitride.While in an inert atmosphere(N2),surface oxidation of nano-silicon nitride can be effectively suppressed.This work will be a helpful mechanism research on the surface modification of Si3N4 nanopowder.
Keywords:silicon nitride  surface structure  FT-IR  XPS
本文献已被 CNKI 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号