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Investigation on resist development rate model for synchrotron radiation X-ray lithography |
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| Affiliation: | XIE Changqing CHEN Mengzhen WANG YulingSUN Baoyin ZHOU Shenghui(Microelectron R & D Centre, Chinese Academy of Sciences, Beijing 100010, China)and ZHU Zhangzhen(Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100039, China) |
| Abstract: | |
| Keywords: | synchrotron radiation X-ray lithography resist development rate model Marquardt method. |
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