| The development and application of silicon Neutron Transmutation Doping （NTD） technology in China |
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| 引用本文： | Qiao Chenyang,Sun Zhiyong,Ke Guotu,Lu Cungang,Shen Feng,Chen Huiqiang. The development and application of silicon Neutron Transmutation Doping （NTD） technology in China[J]. 中国工程科学, 2009, 7(4): 95-100 |
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| 作者姓名： | Qiao Chenyang Sun Zhiyong Ke Guotu Lu Cungang Shen Feng Chen Huiqiang |
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| 作者单位： | China Institute of Atomic Energy, Beijing 102413, China |
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| 基金项目： | Acknowledgments We are indebted to Liu Fenglin in NPIC and Li Zhaomin in CAEP for their help in providing information on NTD practice at research reactors, we are grateful to Gao Jijin for his help in offering very valuable references. |
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| 摘 要： | ：The research and development history of silicon Neutron Transmutation Doping （NTD） technology and its applications at home and abroad are introduced in this paper. The advantages of NTD, compared with conventional technology of doping, are narrated. The principle of NTD as well as the implementation of the main procedures related to Si NTD is explained. The market demand tendency is prospected, and the advanced measures on NTD quality control are described.
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| 关 键 词： | 中子嬗变掺杂 技术 应用 中国 硅 执行情况 需求趋势 质量控制 |
The development and application of silicon Neutron Transmutation Doping (NTD) technology in China |
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| Qiao Chenyang,Sun Zhiyong,Ke Guotu,Lu Cungang,Shen Feng,Chen Huiqiang. The development and application of silicon Neutron Transmutation Doping (NTD) technology in China[J]. Engineering Sciences, 2009, 7(4): 95-100 |
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| Authors: | Qiao Chenyang Sun Zhiyong Ke Guotu Lu Cungang Shen Feng Chen Huiqiang |
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| Affiliation: | Qiao Chenyang,Sun Zhiyong,Ke Guotu,Lu Cungang,Shen Feng,Chen Huiqiang(China Institute of Atomic Energy,Beijing 102413,China) |
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| Abstract: | The research and development history of silicon Neutron Transmutation Doping (NTD) technology and its applications at home and abroad are introduced in this paper.The advantages of NTD,compared with conventional technology of doping,are narrated.The principle of NTD as well as the implementation of the main procedures related to Si NTD is explained.The market demand tendency is prospected,and the advanced measures on NTD quality control are described. |
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| Keywords: | monocrystal silicon Neutron Transmutation Doing (NTD) uniformity doping accuracy application design |
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