| 衬底温度对NiTi薄膜晶化温度的影响 |
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| 引用本文： | 陶艳春,李永华,徐跃,孟繁玲,郑伟涛,邵振杰,赵江.衬底温度对NiTi薄膜晶化温度的影响[J].吉林大学学报(理学版),2005,43(2):197-200. |
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| 作者姓名： | 陶艳春 李永华 徐跃 孟繁玲 郑伟涛 邵振杰 赵江 |
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| 作者单位： | 吉林大学,化学学院超分子结构国家重点实验室,长春,130012;东北大学,秦皇岛分校基础部,河北省,秦皇岛,066004;吉林大学,测试科学试验中心,长春,130023;吉林大学,材料科学与工程学院材料科学系,长春,130012 |
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| 基金项目： | 国家自然科学基金(批准号:50372024)，吉林省科委基金(批准号:20020611) |
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| 摘 要： | 采用直流磁控溅射方法, 制备出沉积在不同温度衬底上
的NiTi薄膜. 应用X射线衍射、 小角X射线散射和差热扫描量热法研究了两种衬底温度(室温和573 K)溅射的NiTi合金薄膜晶化温度和在763 K退火1 h的晶化程度.
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| 关 键 词： | NiTi薄膜 晶化温度 差热扫描量热法 |
| 文章编号： | 1671-5489(2005)02-0197-04 |
| 收稿时间： | 2004-06-15 |
| 修稿时间： | 2004年6月15日 |
Effect of Substrate Temperature on Crystallization Temperature of NiTi Thin Films |
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| TAO Yan-chun,LI Yong-hua,XU Yue,MENG Fan-ling,ZHENG Wei-tao,SHAO Zhen-jie,ZHAO Jiang.Effect of Substrate Temperature on Crystallization Temperature of NiTi Thin Films[J].Journal of Jilin University: Sci Ed,2005,43(2):197-200. |
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| Authors: | TAO Yan-chun LI Yong-hua XU Yue MENG Fan-ling ZHENG Wei-tao SHAO Zhen-jie ZHAO Jiang |
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| Institution: | 1. Key Laboratory for Supramolecular Structure and Materials, College of Chemistry, Jilin University, Changchun 130012, China; 2. Division of Basic Courses, Northeastern University at Qinhuangdao, Qinhuangdao 066004, Hebei Province, China; 3. Test Science Experiment Center, Jilin University, Changchun 130023, China; 4. Department of Materials Science, College of Material Science and Engineering, Jilin University, Changchun 130012, China |
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| Abstract: | NiTi thin films were deposited on different substrates at room temperature and 573 K, respectively by means of D.C. magnetron sputtering. X-ray diffraction, small-angle X-ray scattering and differential scanning calorimetery were used to study the crystalline characteristics and the crystallization temperature of NiTi thin films and the crystallinity of the NiTi thin film annealed at 763 K for 1 h. |
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| Keywords: | NiTi thin film crystallization temperature differential scanning calorimetery |
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