含氢类金刚石碳膜的拉曼光谱洛伦兹分解

利用射频等离子体增强化学气相沉积(rf PECVD)工艺在不锈钢基底上制备a-C:H膜,利用激光Raman光谱表征所沉积碳膜的微观结构,特别是通过对拉曼谱图进行洛伦兹分解来评价所沉积碳膜的sp3含量,分析了沉积电压和过渡层对a-C:H膜生长过程及膜中sp3含量的影响.结果表明,利用拉曼光谱的洛伦兹分解能够有效分析a-C:H的结构特性,碳膜沉积过程中沉积电压和过渡层对a-C:H膜的生长均具有重要影响.在本实验条件下,以Ti/TiN/TiC为过渡层沉积电压为2500 V时所制备的a-C:H膜中的sp3含量最高.

Lorentzian Decomposition for Raman Spectrum of Hydrogenated DLC Thin Films

The a-C:H(hydrogenated diamond-like carbon) thin films were deposited on stainless steel substrates by means of rf PECVD(radio frequency plasma enhanced chemical vapor deposition) process and the Raman spectrum was applied to the characterization of the microstructure of those thin films.Especially,the Lorentzian decomposition was carried out for the Raman spectra to estimate the sp3 content in the films deposited so as to investigate the effects of the voltage during deposition process and transition layer on the growth of film and sp3 content in the resultant film.The results indicated that Lorentzian decomposition for the Raman spectra can effectively characterize the microstructure of a-C:H film,and in the deposition process the voltage and transition layer affect greatly the growth of a-C:H film.Under conditions that the characterization was done,the sp3 content in a-C:H film deposited under 2500V with Ti/TiN/TiC as transition layer comes up to its maximum value.