| 电致变色中电介质膜参数的研究 |
| |
| 引用本文： | 陈永军,林永昌.电致变色中电介质膜参数的研究[J].北京理工大学学报,1995,15(4):348-352. |
| |
| 作者姓名： | 陈永军 林永昌 |
| |
| 作者单位： | 北京理工大学光电工程系 |
| |
| 摘 要： | 对电介型电致变色系统的基本原理进行了探讨，给出了电介型Ｇ／ＩＴＯ／ＷＯ３／Ｔａ２Ｏ５／ＩＴＯ系统用电子束蒸发的制备参数，分析了电介质中的吸附水对着色的重要意义，对影响该系统性能的因素如制备工艺参数、ＩＴＯ膜方块电阻和电场大小等进行了讨论，最后对电介质膜层提出了要求。
|
| 关 键 词： | 薄膜 电致变色 离子导体 电子束蒸发 |
Dielectric Film Parameters for Electrochromism |
| |
| Chen Yongjun,Lin Yongchang.Dielectric Film Parameters for Electrochromism[J].Journal of Beijing Institute of Technology(Natural Science Edition),1995,15(4):348-352. |
| |
| Authors: | Chen Yongjun Lin Yongchang |
| |
| Abstract: | The principle of electrochromatic system involving dieledric layer is studied.The preparation parameters of G/ITO/WO3/Ta2O5/ITO system produced by electron beam evaporation are showed. the effect of adsorbed water contained in dielectric film on coloration is also analyzed. In addition, the other factors that have influence on the system performance, such as processing parameters, the sheet resistance of ITO film and the strength of applied voltage, are discussed. Finally, the requirements for dielectric layer are presented. |
| |
| Keywords: | thin films/electrochromism ion conductor electron beam evaporation |
| 本文献已被 CNKI 维普 等数据库收录！ |
| 点击此处可从《北京理工大学学报》浏览原始摘要信息 |
| 点击此处可从《北京理工大学学报》下载免费的PDF全文 |
