| 多靶射频磁控共溅射SmCo/Cr薄膜的制备和磁性能 |
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| 引用本文： | 章平,黄致新,张玉龙,王辉,张峰.多靶射频磁控共溅射SmCo/Cr薄膜的制备和磁性能[J].咸宁学院学报,2006,26(6):47-49. |
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| 作者姓名： | 章平 黄致新 张玉龙 王辉 张峰 |
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| 作者单位： | 1. 郧阳师范高等专科学校,物理系,湖北,丹江口,442700
2. 华中师范大学,物理系,湖北,武汉,430079 |
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| 摘 要： | 采用多靶射频磁控共溅射方法制备了SmCo/Cr薄膜,用XRD和VSM测量了各样品的微结构和矫顽力.结果表明,SmCo膜具有较强的垂直各向异性,当Cr底层溅射时间为5min、SmCo磁性层溅射时间为14min、Co靶溅射功率为220W时,所得到的薄膜垂直矫顽力最大.
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| 关 键 词： | 多靶共溅射 SmCo/Cr薄膜 矫顽力 |
| 文章编号： | 1006-5342(2006)06-0047-03 |
| 修稿时间： | 2006年6月25日 |
Preparation and Properties of Smco/cr Films by RF magnetron Sputtering More Target Together |
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| ZHANG Ping,HUANG Zhi-xin,ZHANG Yu-long,WANG Hui,ZHANG Feng.Preparation and Properties of Smco/cr Films by RF magnetron Sputtering More Target Together[J].Journal of Xianning College,2006,26(6):47-49. |
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| Authors: | ZHANG Ping HUANG Zhi-xin ZHANG Yu-long WANG Hui ZHANG Feng |
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| Abstract: | SmCo/Cr thin film had prepared by magnetron sputtering more target together.The microstructure and coercive force of the samples were measured by using XRD and VSM.The results showed that origin in SmCo/Cr thin film is perpendicular magnetic anisotropy.When the sputtering time of Cr underlayer is 5min,the sputtering time of SmCo magneticlayer is 14 min,and the sputtering power of Co target is 220W,the coercive force of the thin film get maximum. |
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| Keywords: | More target sputtering together SmCo/Cr thin film Coercive force |
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