首页 | 本学科首页   官方微博 | 高级检索  
     检索      

磁控溅射制备的氧化钒薄膜的结构研究
引用本文:王玫,崔敬忠.磁控溅射制备的氧化钒薄膜的结构研究[J].兰州大学学报(自然科学版),1999,35(1):62-66.
作者姓名:王玫  崔敬忠
作者单位:[1]兰州大学物理学系 [2]兰州物理研究所
摘    要:用X射线光电子谱(XPS),原子力显微镜(AFM)和X射线衍射(XRD)研究了磁控溅射制备的氧化钒薄膜的宏观、微观和电子学结构。建立了薄膜的相结构与XPS谱中V2p3/2特征峰的结合能之间的定量关系。给出了二氧化钒薄膜的AFM像。所得到的二氧化钒热致变色薄膜的结构特性与光电特性相一致。

关 键 词:氧化钒  薄膜  结构  磁控溅射  制备

Structure Characterization of Vanadium Oxide Thin Films Prepared by Magnetron Sputtering Methods
Wang Mei ,Li Ximei ,Cui Jingzhong ,Da Daoan ,Jiang Wanshun ,Qiu Jiawen.Structure Characterization of Vanadium Oxide Thin Films Prepared by Magnetron Sputtering Methods[J].Journal of Lanzhou University(Natural Science),1999,35(1):62-66.
Authors:Wang Mei  Li Ximei  Cui Jingzhong  Da Daoan  Jiang Wanshun  Qiu Jiawen
Institution:Wang Mei 1,Li Ximei 1,Cui Jingzhong 2,Da Daoan 2,Jiang Wanshun 2,Qiu Jiawen 2
Abstract:Vanadium oxide thin films prepared by magnetron sputtering methods have been studied by X ray photoelectron spectroscopy,atomic force microscopy and X ray diffraction. The quantitative relations between the phases of vanadium oxide films and the V 2 p 3/2 binding energy in the XPS were obtained. The AFM images show the vanadium dioxide thin films clearly. The electronic, micro and macro properties of VO 2 thin film are coincident with its optical and electrical measurements.
Keywords:vanadium oxide  thin film  structure
本文献已被 CNKI 维普 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号