| 玻璃包覆FeCoSiB微丝包覆层化学去除方法 |
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| 引用本文： | 王成铎,张志豪,刘雪峰,谢建新.玻璃包覆FeCoSiB微丝包覆层化学去除方法[J].北京科技大学学报,2009,31(5). |
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| 作者姓名： | 王成铎 张志豪 刘雪峰 谢建新 |
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| 作者单位： | 北京科技大学材料科学与工程学院,北京,100083 |
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| 摘 要： | 以玻璃包覆FeCoSiB合金微丝为对象,研究了氢氟酸含量和反应温度对包覆层去除过程的影响,以及缓蚀剂对Fe-CoSiB芯丝的保护效果.结果表明:在反应温度为25℃的条件下,当所采用的HF质量分数从10%增加到40%时,玻璃包覆层去除速度从0.005μm.s-1提高至0.076μm.s-1;在HF质量分数为40%的条件下,当反应温度从10℃升高到45℃时,玻璃包覆层去除速度从0.033μm.s-1提高到0.234μm.s-1;反应温度为20～25℃时,用质量分数40%的氢氟酸溶液去除厚度范围为7.5～9.0μm高硼硅玻璃包覆层的最佳时间为150s;硫氰酸钠及硫氰酸钠+乌洛托品作为缓蚀剂均可显著抑制氢氟酸溶液对芯丝的腐蚀,硫氰酸钠+乌洛托品还可有效减少金属吸氢,有利于防止芯丝力学性能的劣化.
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| 关 键 词： | 玻璃包覆微丝 化学去除 氢氟酸 缓蚀剂 |
Coating removal of glass-coated FeCoSiB microwires by chemical method |
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| WANG Cheng-duo,ZHANG Zhi-hao,WANG Yu,LIU Xue-feng,XIE Jian-xin School of Materials Science , Engineering,University of Science , Technology Beijing,Beijing ,China.Coating removal of glass-coated FeCoSiB microwires by chemical method[J].Journal of University of Science and Technology Beijing,2009,31(5). |
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| Authors: | WANG Cheng-duo ZHANG Zhi-hao WANG Yu LIU Xue-feng XIE Jian-xin School of Materials Science Engineering University of Science Technology Beijing Beijing China |
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| Institution: | WANG Cheng-duo,ZHANG Zhi-hao,WANG Yu,LIU Xue-feng,XIE Jian-xin School of Materials Science , Engineering,University of Science , Technology Beijing,Beijing 100083,China |
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| Abstract: | |
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| Keywords: | glass-coated microwires chemical removal hydrofluoric acid inhibitor |
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