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可见光波段发光多孔硅膜的结构特征研究
引用本文:赵特秀 吴自勤. 可见光波段发光多孔硅膜的结构特征研究[J]. 中国科学技术大学学报, 1992, 22(4): 450-454
作者姓名:赵特秀 吴自勤
作者单位:中国科学技术大学物理系(赵特秀,吕智慧,孙国喜,叶坚,王晓平,刘磁辉),中国科学技术大学基础物理中心(吴自勤)
摘    要:采用在HF溶液中阳极处理硅单晶片的方法制备了具有可见光波段发光特性的多孔硅膜。应用X光衍射技术及激光喇曼散射谱研究了发光多孔硅膜的结构特征。研究结果表明:纳米量级尺寸是多孔硅膜的一个重要特征。估计多孔硅硅柱横截面直径在几到十几纳米之间。

关 键 词:多孔硅  量子线  XRD  Raman谱

Structure Characteristic of Porous Silicon Films With Visible Photoluminescence
Zhao Texiu Lu Zhihui Sun Guoxi Ye Jian Wang Xiaoping Liu Cihui. Structure Characteristic of Porous Silicon Films With Visible Photoluminescence[J]. Journal of University of Science and Technology of China, 1992, 22(4): 450-454
Authors:Zhao Texiu Lu Zhihui Sun Guoxi Ye Jian Wang Xiaoping Liu Cihui
Affiliation:Zhao Texiu Lu Zhihui Sun Guoxi Ye Jian Wang Xiaoping Liu Cihui (Department of Physics) Wu Ziqin (Center of Fundamental Physics)
Abstract:The Porous silicon films producing visible photoluminescence are prepared by anodization of ptype single-crystal Si wafers in hydrofluoric acid solution. The structural characteristic of these porous silicon films are studied by X-ray diffraction technoligy and Laser Raman scattering measurement. It is shown that the quantum dimension with nanometer order size is an important structural characteristic of porous silicon films.
Keywords:porous silicon  quantum wire  XRD  Raman spectropcopy
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