| 磁性多层膜Ta/NiO/NiFe/Ta角分辨XPS |
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| 引用本文： | 于广华,朱逢吾,马纪东,王安荣. 磁性多层膜Ta/NiO/NiFe/Ta角分辨XPS[J]. 北京科技大学学报, 2002, 24(2): 191-193. DOI: 10.3321/j.issn:1001-053X.2002.02.023 |
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| 作者姓名： | 于广华 朱逢吾 马纪东 王安荣 |
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| 作者单位： | 北京科技大学材料物理系,北京,100083 |
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| 基金项目： | 国家自然科学基金;19890310; |
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| 摘 要： | 磁性多层膜Ta/NiO/NiFe/Ta由磁控溅射方法制备.采用角分辨X射线光电子能谱(XPS)研究了反铁磁(NiO)/铁磁(NiFe)界面.结果表明,在NiO/NiFe界面发生了化学反应: NiO+Fe = Ni+FeO和3NiO+2Fe =3Ni+Fe2O3,此反应深度约为1～1.5 nm.反应产物将影响NiO对NiFe的交换耦合.
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| 关 键 词： | 角分辨X射线光电子能谱 NiO/NiFe界面 交换耦合 界面反应 |
| 修稿时间： | 2001-12-31 |
Angle-resolved XPS Studies of Magnetic Multilayers Ta/NiO/NiFe/Ta |
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| YU Guanghua,M Jidong,ZHU Fengwu Materials Science and Engineering School,UST Beijing,Beijing ,China. Angle-resolved XPS Studies of Magnetic Multilayers Ta/NiO/NiFe/Ta[J]. Journal of University of Science and Technology Beijing, 2002, 24(2): 191-193. DOI: 10.3321/j.issn:1001-053X.2002.02.023 |
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| Authors: | YU Guanghua M Jidong ZHU Fengwu Materials Science Engineering School UST Beijing Beijing China |
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| Affiliation: | YU Guanghua,M4 Jidong,ZHU Fengwu Materials Science and Engineering School,UST Beijing,Beijing 100083,China |
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| Abstract: | Ta/NiO/NiFe/Ta multilayers were prepared by magnetron sputtering. The composition and chemical states at the interface region of NiO/NiFe were studied using the angle-resolved X-ray photoelectron spectroscopy (XPS). The results show that there are two thermodynamically favorable reactions at NiO/NiFe interface: NiO+Fe = Ni+FeO and 3NiO+2Fe =3 Ni+Fe2O3 The thickness of the chemical reaction as estim- ated by angle-resolved XPS was about 1-1.5 nm. These interface reaction products are magnetic defects, and- the exchange coupling field Hex and the coercivity H~ of NiO/NiFe are affected by these defects. |
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| Keywords: | angle-resolved XPS NiO/NiFe exchange coupling interface reaction |
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