BCN薄膜的结构及其内应力研究

用射频反应溅射法制备出BCN薄膜。X射线衍射和傅立叶红外吸收光谱量发现样品的组成原子之间实现了原子级化合，样品与Si衬底之间存在较大的应力。样品剥落后，应力的消除使红外吸收峰位向低波数移动。实际还发现，衬底材料对样品中的压应力影响很大，压应力的释放与衬底密切相关：在硅衬底上呈枫叶状隆起，在石英衬底上样品呈周期性的拆线状隆起。

Studies on the Structure and Stress of BCN Thin Films

BCN thin films were grown by RF reactive sputtering. XRD and FTIR measurements suggested that there was a larger stress between the films and Si substrate. When the films were peeled off the substrate, stress relaxes and the IR absorption peaks shifted to lower wave numbers. Also, it was found that substrates play an important role in the formation of the stress, and the stress relaxation was dependent on the used substrates: on Si substrate, the pattern of the stress relaxation looked like maple leaves; on quartz substrate, it looked like periodically distributed broken lines.