| 溅射沉积InP薄膜的研究 |
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| 引用本文： | 黎锡强.溅射沉积InP薄膜的研究[J].应用科学学报,1987,5(1):66-71. |
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| 作者姓名： | 黎锡强 |
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| 作者单位： | 中国科学院上海冶金研究所 |
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| 摘 要： | 本文报道了以射频溅射仪溅射沉积非晶态InP薄膜.并用X光衍射法、反射电子衍射怯、扫描电镜、红外分光光度计及俄歇能谱仪等研究了薄膜结构、貌相、组分及吸收边光谱等.并与富In的InP多晶薄膜作比较.
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| 收稿时间： | 1984-05-06 |
| 修稿时间： | 1984-12-26 |
RF SPUTTERING OF InP FILMS |
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| LI XIQIANG.RF SPUTTERING OF InP FILMS[J].Journal of Applied Sciences,1987,5(1):66-71. |
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| Authors: | LI XIQIANG |
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| Institution: | Shanghai Institute of Metallurgy, Academia Sinica |
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| Abstract: | The present paper is a report on the deposition of InP films on different substrates by sputtering. Using SEM, AES, X-ray diffractions, RED and infrared spectrophotometer, we have studied the topography, composition, crystal orientation, absorption edge spectrum etc. |
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