NO2对光催化降解庚烯的作用

以TiO₂/SiO₂为光催化剂， 在紫外光作用下， 讨论了NO₂存在时， 庚烯在TiO₂/SiO₂上的吸附和光催化降解作用. 通过GC-MS和FT-IR， 分别测定了3种不同体系的反应产物， 从而推测出可能的反应机理. 实验结果表明， TiO₂/SiO₂对庚烯的最大吸附量M_max=3.10　mg， 当存在NO₂（44.64 μmol/L）时M_max=3.80　mg. 在光催化降解庚烯的反应中， 当NO₂加入量较大(NO₂≥89.28 μmol/L)时， 庚烯降解反应速率加快， 但矿化度比无 NO₂时的小.

The Effects of NO2 for the Photocatalytic Degradation of Heptene

The adsorption and photocatalytic degradation of heptene on TiO₂/SiO₂ photocatalyst under the irradiation of UV light were investigated carefully in the presence of NO₂. By means of GC-MS and FT-IR， we respectively determined the intermediate products of the three different reaction systems, and accordingly deduced the possible reaction mechanisms. The experiment data indicate that M_max (the maximum adsorption amount of TiO₂/SiO₂ for heptene) is 3.10 mg, and is increased to 3.80 mg in the presence of NO₂（44.64 μmol/L）. In the photocatalytic degradation of heptene, addition of a large amount of NO₂ (NO₂≥89.28 μmol/L) can accelerate the photodegradation reaction rate of heptene, but its mineralization degree with the addition of NO₂ is lower than that without the addition of NO₂.