原子力显微镜形貌像成像质量的研究

基于针尖和样品之问的各种相互作用力，原子力显微镜可用于样品表面形貌、摩擦力等各种物理特性的研究。仪器参数的设定和干扰的排除是提高样品表面形貌像成像质量的关键。通过实验发现由原子力显微镜扫描得到的材料表面形貌像中常出现拖曳、条纹，影响了形貌像的成像质量。针对特定工艺条件下的纳米电子功能薄膜样品，着重研究了振幅参数（Amplitude reference）、积分增益（Integral gain）、比例增益（Proportiong ain）、衰减增益（Attenuation gain）和速度增益（Speed gain）对形貌像成像质量的影响。根据这些规律找出消除或减轻样品表面形貌像中出现拖曳、条纹的方法。

Study on the Quality of Topographic Images of the AFM Affected by Apparatus Parameters

The atomic force microscope based on the various forces between tips and samples could be used to investigate the various physical properties, such as the sample surface morphology, friction force, etc. Setting of the proper instrument parameters and elimination of the interference are the key to improve the quality of the surface topography image. According to the experiment, draws and stripes always appear in the surface topography image of the material scanned by AFM, which affect the quality of the surface topography image. For a certain film with electronic function in nanometer measure, the effect of amplitude reference, integral gain, proportion gain, attenuation gain and speed gain to the surface topography image are investigated. Based on the rules, the way to eliminate or lighten the draws and stripes appeared in the surface topography image can be found.