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氮气氛直拉硅中氧沉淀的研究
引用本文:佘思明,廖平婴,彭世宽,李立本. 氮气氛直拉硅中氧沉淀的研究[J]. 中南大学学报(自然科学版), 1993, 0(2)
作者姓名:佘思明  廖平婴  彭世宽  李立本
作者单位:中南工业大学,中南工业大学,中南工业大学,浙江大学
基金项目:浙江大学高纯硅及硅烷国家重点实验室资助
摘    要:用傅里叶红外光谱、透射电镜和化学腐蚀研究了氮气氛直拉硅(NCZSi)中的氧沉淀。结果指出,原生NCZSi中存在氧对-硅-氧复合物;N集中于氧沉淀的中心区域;N参子的中心区域表现出热稳定性。文中还提出了关于NCZSi中氧沉淀形核和生长途径的假设。

关 键 词:直拉硅  氧沉淀  缺陷

INVESTIGATION ON OXYGEN PRECIPITATION IN NCZSi
She Siming,Liao Pingying,Peng Shikuan Central South University of TechnologyLi Liben Zhejiang University. INVESTIGATION ON OXYGEN PRECIPITATION IN NCZSi[J]. Journal of Central South University:Science and Technology, 1993, 0(2)
Authors:She Siming  Liao Pingying  Peng Shikuan Central South University of TechnologyLi Liben Zhejiang University
Affiliation:She Siming;Liao Pingying;Peng Shikuan Central South University of TechnologyLi Liben Zhejiang University
Abstract:The oxygen precipitation in NCZSi has been investigated in this paper by means ofFTIR,TEMand WE etc.The experimental results indicate that there are Np-Si-O complexesin as-grown NCZSi and that the N atoms gather around the centers of oxygen precipitates.These N-participates centers show thermal stability.Hypotheses concerning the nucleationand growth of oxygen precipitates in NCZSi are also suggested in this paper.
Keywords:CZSi  oxygen precipitation  defect
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